Achieving Less Than 100 ppb Total Metal Ion Concentration in ESCAP Resins Synthesized by Atom Transfer Radical Polymerization

Yingchao Liu,Jinshan Wang,Weimin Li
DOI: https://doi.org/10.1002/mame.202300418
2024-01-31
Macromolecular Materials and Engineering
Abstract:The environmentally stable chemical amplified photoresist resin is synthesized via atom transfer radical polymerization achieving polydispersity index as low as 1.25. It is then purified by ion exchange with two different resins, IRC747 and A15, which are effective at removing Cu and other metal ions. This reduces the total metal ion concentration in the copolymer powder to <30 ppb with individual metal ion 1.5. Although using atom transfer radical polymerization (ATRP) can result in lower PDI, the potential of high metal ion contamination is a major concern, as the reaction initiators usually are copper‐containing compounds. In this study, copolymer of p‐acetoxy styrene and tert‐butyl acrylate [poly(AOST‐co‐TBA)] is synthesized via ATRP achieving PDI as low as 1.25. It is then purified by ion exchange with two different resins, IRC747 and A15, which are effective at removing Cu and other metal ions. This reduces the total metal ion concentration in the copolymer powder to <30 ppb with individual metal ion <6 ppb. This is the first reported ATRP synthesized ESCAP resin having both low PDI and metal ion concentrations suitable for 248 nm photoresist application.
materials science, multidisciplinary,polymer science
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