Transport and leakage in super-critical thickness strained silicon directly on insulator MOSFETs with strained Si thickness up to 135 nm

I. Åberg,Z. Cheng,T. Langdo,I. Lauer,Anthony Lochtefeld,D. Antoniadis,J. Hoyt

DOI: https://doi.org/10.1109/SOI.2005.1563521

2005-12-27

Abstract:In this work, we study both FD- and PD-SSOI with aggressive T/sub Si/ of up to 135 nm for 14% SSOI (14% Ge equivalent strain). We have demonstrated that mobility in 14% SSOI is independent of the strained Si thickness, even for as grown films 10/spl times/ thicker than the critical thickness. Off-state current also remains independent of T/sub Si/. The successful fabrication of PD-SSOI with electron mobility enhancement maintained at 1.5/spl times/, for high channel doping and strained Si thickness up to 135 nm, was also demonstrated, showing promise for thicker film PD-SOI applications.