Carrier Trapping in Wrinkled 2D Monolayer MoS 2 for Ultrathin Memory

Rongjie Zhang,Yongjue Lai,Wenjun Chen,Changjiu Teng,Yujie Sun,Liusi Yang,Jingyun Wang,Bilu Liu,Hui-Ming Cheng
DOI: https://doi.org/10.1021/acsnano.2c00350
IF: 17.1
2022-03-24
ACS Nano
Abstract:Atomically thin two-dimensional (2D) semiconductors are promising for next-generation memory to meet the scaling down of semiconductor industry. However, the controllability of carrier trapping status, which is the key figure of merit for memory devices, still halts the application of 2D semiconductor-based memory. Here, we introduce a scheme for 2D material based memory using wrinkles in monolayer 2D semiconductors as controllable carrier trapping centers. Memory devices based on wrinkled monolayer MoS2 show multilevel storage capability, an on/off ratio of 106, and a retention time of >104 s, as well as tunable linear and exponential behaviors at the stimulation of different gate voltages. We also reveal an interesting wrinkle-based carrier trapping mechanism by using conductive atomic force microscopy. This work offers a configuration to control carriers in ultrathin memory devices and for in-memory calculations.The Supporting Information is available free of charge at https://pubs.acs.org/doi/10.1021/acsnano.2c00350.Optical microscopy, PL, Raman, and AFM characteristics of the DP CVD grown monolayer MoS2 and wrinkled MoS2; transfer characteristics of the MoS2-based FET without wrinkles; current profile of the wrinkled MoS2-based FET after the application of positive gate voltage; current evolution of the wrinkled MoS2-based FET under −80 V and +80 V gate pulse voltage; optical microscopy images and AFM characteristics of wrinkled MoS2 transferred by PDMS-assisted method (PDF)This article has not yet been cited by other publications.
materials science, multidisciplinary,chemistry, physical,nanoscience & nanotechnology
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