Characterization of residual debris on packaged hip arthroplasty stems demonstrates the dominance of less than 10 μm sized particulate: Updated USP788 guidelines for orthopedic implants

Nadim J. Hallab,Salem R. Hallab,Anastasia Alexander,Robin Pourzal
DOI: https://doi.org/10.1002/jbm.b.35387
2024-02-12
Journal of Biomedical Materials Research Part B Applied Biomaterials
Abstract:Abstract Past evaluation of particle contamination on packaged implants has typically been conducted using US Pharmacopeia (USP) 788, a 1970s pharmaceutical guideline created to evaluate contaminant particles in injectable fluids and syringes. Our objective was to reestablish relevant acceptance criteria for residual orthopedic and other implant debris, including smaller particles (i.e., 99% of eluted particles were calcium phosphate. For plain non‐coated THA‐stems, >99% of eluted particles were titanium‐alloy‐based. The number‐based median size of particles in both groups was approximately 1.5 μm in diameter despite being composed of different materials. The total volume of particulate removed from HA‐coated stems was 0.037 mm 3 (671 × 10 3 particles total), which was approximately >50‐fold more volume than that on plain non‐coated stems at 0.0006 mm 3 (89 × 10 3 particles total). Only non‐coated THA stems passed reestablished USP788 acceptance criteria, compared by using equivalent total volumes of contaminant particulate within new and legacy guideline ranges of >10 and >25 μm ECD, that is, <1.0 × 10 7 particles for <1 μm diameter in size, <600,000 for <1–10 μm, <6000 for 10–25 μm and 25 μm. These results fill a knowledge gap on how much residual debris can be expected to exist on packaged implants and can be used as a basis for updating acceptance criteria (i.e., termed USP788‐Implant [USP788‐I]). Residual implant particulate assessment is critical given the increasing implant complexity and new manufacturing techniques (e.g., additive manufacturing).
engineering, biomedical,materials science, biomaterials
What problem does this paper attempt to address?