Polyvinyl alcohol: a high-resolution hydrogel resist for humidity-sensitive micro-/nanostructure

Jian Zhang,Chao Huang,Yingxin Chen,Hu Wang,Zhongmiao Gong,Weiqian Chen,Haixiong Ge,Xin Hu,Xuefeng Zhang
DOI: https://doi.org/10.1088/1361-6528/ab9da7
IF: 3.5
2020-07-30
Nanotechnology
Abstract:A high-resolution nanopatterning technique is desirable with the present rapid development of hydrogel nanodevices. Here, we demonstrate that polyvinyl alcohol (PVA), a popular polymeric hydrogel, can function as the negative-tone resist for electron beam lithography (EBL) with a resolution capability as narrow as 50 nm half-pitch. Furthermore, the hydrophilic groups of PVA are stable after EBL exposure, and thus the pattern still shows rapid responsivity to humidity change. An aqueous nanopatterning process including dissolution, spin-coating and development is setup, which is friendly for organic device fabrication free of organic solvent. This high-resolution nanopatterning technique with PVA is helpful for the design and realization of hydrogel-related nanodevices in the future.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology
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