Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit"

Ole Steuernagel

DOI: https://doi.org/10.48550/arXiv.quant-ph/0305042

2003-05-08

Quantum Physics

Abstract:Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit" The effective absorption rates in quantum lithography are very low.

What problem does this paper attempt to address?

Suppression of Quantum Noises in Coherent Atom Lithography Through Squeezing

Anqi Zhang,Zeyang Liao,Rongxin Chen,Da-Wei Wang

DOI: https://doi.org/10.1364/josab.35.000752

2018-01-01

Journal of the Optical Society of America B

Abstract:Abbe’s diffraction limit restricts the resolution of an optical imaging and lithography system. A coherent Rabi oscillation is shown to be able to overcome the diffraction limit in both optical and atom lithography. In previous studies, semiclassical theory is applied, where the driving field is treated as a classical light, and quantum fluctuation is neglected. Here, we show that the quantum fluctuation may reduce the visibility of the superresolution pattern. However, by squeezing the photon number fluctuation, we are able to significantly increase its visibility.
Sub-diffraction Optical Beam Lithography Based on a Center-Non-zero Depletion Laser

Chenyi Su,Chenliang Ding,Zhenyao Yang,Chun Cao,Yiwei Qiu,Dazhao Zhu,Cuifang Kuang,Xu Liu

DOI: https://doi.org/10.1364/ol.504691

IF: 3.6

2024-01-01

Optics Letters

Abstract:Photoinhibition (PI) mechanisms have been introduced in nanofabrication which allows breaking the diffraction limit by large factors. Donut-shaped laser is usually selected as a depletion beam to reduce linewidth, but the parasitic process has made the results of the experiment less than expected. As a result, the linewidth is difficult to achieve below 50 nm with 780 nm femtosecond and 532 nm continuous-wave lasers. Here, we propose a new, to the best of our knowledge, method based on a center-non-zero (CNZ) depletion laser to further reduce linewidth. By constructing a smaller zone of action under the condition of keeping the maximum depletion intensity constant, a minimum linewidth of 30 nm (λ / 26) was achieved. Two ways to construct CNZ spots were discussed and experimented, and the results show the advantages of our method to reduce the parasitic process to further improve the writing resolution.
Comment on the Comment on Deformation of Quantum-Mechanics

YQ LI,ZM SHENG

DOI: https://doi.org/10.1088/0253-6102/24/3/384

1995-01-01

Communications in Theoretical Physics

Abstract:This is a reply to the comment by Chung and Chung [J. Phys. A27 (1994) 5037]. We point out that the discussion there is imperfect.
Comment on "Quantum waveguide array generator for performing Fourier transforms: Alternate route to quantum computing"

Daniel A. Lidar

DOI: https://doi.org/10.48550/arXiv.quant-ph/0308124

2003-08-22

Quantum Physics

Abstract:A Comment on the paper "Quantum waveguide array generator for performing Fourier transforms: Alternate route to quantum computing" by R. Akis and D.K. Ferry, Appl. Phys. Lett. 79, 2823 (2001). The authors reply in Appl. Phys. Lett. 80, 2420 (2002).
On the Relationship between Resolution Enhancement and Multiphoton Absorption Rate in Quantum Lithography

Mankei Tsang

DOI: https://doi.org/10.1103/PhysRevA.75.043813

2007-03-01

Abstract:The proposal of quantum lithography [Boto et al., Phys. Rev. Lett. 85, 2733 (2000)] is studied via a rigorous formalism. It is shown that, contrary to Boto et al.'s heuristic claim, the multiphoton absorption rate of a ``NOON'' quantum state is actually lower than that of a classical state with otherwise identical parameters. The proof-of-concept experiment of quantum lithography [D'Angelo et al., Phys. Rev. Lett. 87, 013602 (2001)] is also analyzed in terms of the proposed formalism, and the experiment is shown to have a reduced multiphoton absorption rate in order to emulate quantum lithography accurately. Finally, quantum lithography by the use of a jointly Gaussian quantum state of light is investigated, in order to illustrate the trade-off between resolution enhancement and multiphoton absorption rate.

Quantum Physics
Experimental demonstration of quantum lithography beyond diffraction limit via Rabi oscillations

Jun Rui,Yan Jiang,Guo-Peng Lu,Bo Zhao,Xiao-Hui Bao,Jian-Wei Pan

DOI: https://doi.org/10.1103/PhysRevA.93.033837

2015-01-27

Abstract:Diffraction of light sets the fundamental limit for optical lithography. Many quantum lithography schemes have so far been proposed to overcome this limit either by making use of highly entangled photons, multi-photon processes or multiple Lambda transitions, which are all experimentally high-demanding. Recently, Liao et al. proposed a novel quantum lithography scheme which merely employs Rabi oscillation to surpass the diffraction limit. Here we report a faithful experimental realization of this scheme. Resolution up to ninth of the Rayleigh diffraction limit has been observed. Possibility of creating an arbitrary pattern is also tested experimentally by demonstrating the peak narrowing process using several Rabi floppings together with state-selective optical depletion. Our work may have direct applications in atom pattern engineering for quantum information or quantum simulation applications, and will also possibly boost the adoption of quantum lithography into real-world applications in the near future.

Quantum Physics,Optics
Comment on Quantum Interference between Light Sources Separated by 150 Million Kilometers Deng et al. PHYSICAL REVIEW LETTERS 123, 080401 (2019)

Shaul Mukamel

DOI: https://doi.org/10.48550/arXiv.2001.02376

2020-01-08

Abstract:This is a comment on the paper : Quantum Interference between Light Sources Separated by 150 Million Kilometers by Deng et al, PHYSICAL REVIEW LETTERS 123, 080401 (2019)

Quantum Physics
Comment on Quantum illumination using polarization-entangled photon pairs for enhanced object detection (Opt. Express 32, 40150-40164, 2024)

Artur Czerwinski,Jakub J. Borkowski

2024-11-07

Abstract:The paper by K. Sengupta et al. (Opt. Express 32, 40150-40164, 2024) explores quantum illumination using polarization-entangled photon pairs for object detection in noisy environments. In this comment, we highlight fundamental flaws in the mathematical model used to describe photon loss. We argue that the treatment of photon loss and its effects on quantum entanglement is incorrect. We demonstrate that the conclusions of Sengupta et al., particularly the detection of low-reflectivity objects using quantum correlations, are unsubstantiated, as the assumed resilience of polarization entanglement to photon loss contradicts established principles of quantum information theory. We present a more rigorous framework for describing the effects of photon loss on both polarization-encoded and photon-number quantum states. Additionally, we critique the approach used in the OE article to model photon loss in free-space optical (FSO) transmission, noting that it is based on a fiber-optic model that was adopted with insufficient attribution from an earlier publication. We propose several improvements to enhance the modeling of FSO photon loss.

Quantum Physics,Optics
Single particle strength restoration and nuclear transparency in high Q^2 exclusive (e,e'p) reactions

L. Frankfurt,M. Strikman,M. Zhalov

DOI: https://doi.org/10.1016/S0370-2693%2801%2900173-3

2000-11-28

Abstract:Quenching of the single particle strength which previously precluded unambiguous measurement of nuclear transparency in quasifree (e,e'p) reactions at high momentum transfer is evaluated from the cross sections of measured processes. We have demonstrated evidence of the single particle strength restoration with increase of the momentum transfer in exclusive (e,e'p) reactions and argue that in practically interesting cases of study the nuclear transparency in these processes quenching is weakly depends on the probability of short range nucleon correlations. It is shown that use of Glauber approximation well describes NE18 and E94-139 (e,e'p) data at the momentum transfers 1 GeV^2 < Q^2 < 3 GeV^2. This gives a further support to our observation that the quenching of nuclear levels strongly depends on the resolution (Q^2)and practically disappears at Q^2>1GeV^2.

High Energy Physics - Phenomenology,Nuclear Theory
Quantum Imaging beyond the Diffraction Limit by Optical Centroid Measurements

Mankei Tsang

DOI: https://doi.org/10.1103/PhysRevLett.102.253601

2009-06-23

Abstract:I propose a quantum imaging method that can beat the Rayleigh-Abbe diffraction limit and achieve de Broglie resolution without requiring a multiphoton absorber as the detector. Using the same non-classical states of light as those for quantum lithography, the proposed method requires only intensity measurements, followed by image post-processing, to produce the same complex image patterns as those in quantum lithography. The method is expected to be experimentally realizable using current technology.

Quantum Physics
Direct Laser Writing Breaking Diffraction Barrier Based on Two-Focus Parallel Peripheral Photoinhibition Lithography (vol 4, 066002, 2022)

Dazhao Zhu,Liang Xu,Chenliang Ding,Zhenyao Yang,Yiwei Qiu,Chun Cao,Hongyang He,Jiawei Chen,Mengbo Tang,Lanxin Zhan,Xiaoyi Zhang,Qiuyuan Sun,Chengpeng Ma,Zhen Wei,Wenjie Liu,Xiang Fu,Cuifang Kuang,Haifeng Li,Xu Liu

DOI: https://doi.org/10.1117/1.ap.5.5.059801

IF: 13.582

2023-01-01

Advanced Photonics

Abstract:Advanced Photonics, co-published by SPIE and Chinese Laser Press, is a highly selective, Gold Open Access, international journal publishing innovative research in all areas of optics and photonics, including fundamental and applied research.
Exact solutions for one of the extensive chaos model

Nikolai A. Kudryashov

DOI: https://doi.org/10.48550/arXiv.nlin/0310046

2003-10-31

Abstract:Sampling equation method is presented to look for exact solutions of nonlinear differential equations. Application of this approach to one of the extensive chaos model is considered. Exact solutions of this model in travelling wave are given. Nonlinear evolution equation for the considered extensive chaos model is shown to have solitary and periodical waves.

Exactly Solvable and Integrable Systems
Towards Non-Degenerate Quantum Lithography

Yu Zhou,Tao Peng,Hui Chen,Jianbin Liu,Yanhua Shih

DOI: https://doi.org/10.3390/app8081292

2018-01-01

Abstract:The photonic de Broglie wavelength of a non-degenerate entangled photon pair is measured by using a Young's double slit interferometer, which proves that the non-degenerate entangled photon pairs have the potential to be used in quantum lithography. Experimental results show that the de Broglie wavelength of non-degenerate biphotons is well defined and its wavelength is neither the wavelength of the signal photon, nor the wavelength of the idler photon. According to the de Broglie equation, its wavelength corresponds to the momentum of the biphoton, which equals the sum of the momenta of signal and idler photons. The non-degenerate ghost interference/diffraction is also observed in these experiments.
Comment on 'Attosecond electron microscopy and diffraction'

P. Baum,C. Ropers

2024-11-22

Abstract:A recent paper by Hui et al. (Ref. [1], Sci. Adv. 10, eadp5805 (2024)) claims the demonstration of 'Attosecond electron microscopy and diffraction' with laser-gated electron pulses. In this comment, we point out a series of physical and technical inconsistencies of the experiment and results. Beyond failing to show any microscopy, the reported concept does not produce properly gated electrons. Furthermore, the noise and signal levels of the presented data are statistically and quantitatively incompatible with the work's interpretation and attosecond dynamics in graphite. These inconsistencies render the claims and conclusions of Ref. [1] unsubstantiated and suggest that the data primarily show an interferometric artifact.

Materials Science,Applied Physics,Optics
Quantum optical technologies for metrology, sensing and imaging

Jonathan P. Dowling,Kaushik P. Seshadreesan

DOI: https://doi.org/10.1109/JLT.2014.2386795

2015-02-28

Abstract:Over the past 20 years, bright sources of entangled photons have led to a renaissance in quantum optical interferometry. Optical interferometry has been used to test the foundations of quantum mechanics and implement some of the novel ideas associated with quantum entanglement such as quantum teleportation, quantum cryptography, quantum lithography, quantum computing logic gates, and quantum metrology. In this paper, we focus on the new ways that have been developed to exploit quantum optical entanglement in quantum metrology to beat the shot-noise limit, which can be used, e.g., in fiber optical gyroscopes and in sensors for biological or chemical targets. We also discuss how this entanglement can be used to beat the Rayleigh diffraction limit in imaging systems such as in LIDAR and optical lithography.

Quantum Physics
Beating the spatial standard quantum limits via adiabatic soliton expansion

Mankei Tsang

DOI: https://doi.org/10.48550/arXiv.quant-ph/0604132

2006-05-09

Abstract:Spatial quantum enhancement effects are studied under a unified framework. It is shown that the multiphoton absorption rate of photons with a quantum-enhanced lithographic resolution is reduced, not enhanced, contrary to popular belief. The use of adiabatic soliton expansion is proposed to beat the standard quantum limit on the optical beam displacement accuracy, as well as to engineer an arbitrary multiphoton interference pattern for quantum lithography. The proposed scheme provides a conceptually simple method that works for an arbitrary number of photons.

Quantum Physics
Comment on “efficient Full-Path Optical Calculation of Scalar and Vector Diffraction Using the Bluestein Method”

Yanlei Hu,Zhongyu Wang,Xuewen Wang,Shengyun Ji,Chenchu Zhang,Jiawen Li,Wulin Zhu,Dong Wu,Jiaru Chu

DOI: https://doi.org/10.1038/s41377-020-00447-9

2020-01-01

Light Science & Applications

Abstract:Efficient calculation of the light diffraction in free space is of great significance for tracing electromagnetic field propagation and predicting the performance of optical systems such as microscopy, photolithography, and manipulation. However, existing calculation methods suffer from low computational efficiency and poor flexibility. Here, we present a fast and flexible calculation method for computing scalar and vector diffraction in the corresponding optical regimes using the Bluestein method. The computation time can be substantially reduced to the sub-second level, which is 105 faster than that achieved by the direct integration approach (~hours level) and 102 faster than that achieved by the fast Fourier transform method (~minutes level). The high efficiency facilitates the ultrafast evaluation of light propagation in diverse optical systems. Furthermore, the region of interest and the sampling numbers can be arbitrarily chosen, endowing the proposed method with superior flexibility. Based on these results, full-path calculation of a complex optical system is readily demonstrated and verified by experimental results, laying a foundation for real-time light field analysis for realistic optical implementation such as imaging, laser processing, and optical manipulation.
Development of Next-Generation Nanolithography Methods to Break the Optical Diffraction Limit

Huiwen Luo,Liang Wang,Jin Qin,Li Ding

DOI: https://doi.org/10.1117/12.2240741

2016-01-01

Abstract:Photolithography has been one of the most important technologies in modern society, especially in semiconductor industry. However, due to the limitation of optical diffraction, this technique becomes more and more complex and expensive. In this paper, we experimentally study two promising techniques, near-field scanning optical lithography and nanoimprint lithography, which both have been proved to be alternatives to photolithography, and achieve sub-wavelength resolution. Taking advantage of bowtie apertures, near-field scanning optical lithography can achieve high resolution beyond the Rayleigh diffractive limit. Here, we report a novel method to fabricate bowtie aperture with sub-15 nm gap, producing highly confined electric near-field by localized surface plasmon (LSP) excitation and nanofocusing of the closely tapered gap, and obtain lithography results with 21 nm resolution (FWHM). We also develop a new plate-to-roll nanoimprint lithography (P2RNIL). Compared with plate-to-plate nanoimprint lithography (P2PNIL) and roll-to-plate nanoimprint lithography (R2PNIL), it avoids cylinder template fabrication in P2RNIL and significantly improves the productivity in P2PNIL. Our P2RNIL system can realize large-area nanoimprint continuously with high resolution and high speed.
Comment on "large Optical Nonlinearity of Semiconducting Single-Walled Carbon Nanotubes under Resonant Excitations".

C.-X. Sheng,Z. Valy Vardeny

DOI: https://doi.org/10.1103/physrevlett.96.019705

IF: 8.6

2006-01-01

Physical Review Letters

Abstract:A Comment on the Letter by A. Maeda et al., Phys. Rev. Lett. 94, 047404 (2005). The authors of the Letter offer a Reply.Received 3 May 2005DOI:https://doi.org/10.1103/PhysRevLett.96.019705©2006 American Physical Society
Quantum limit to subdiffraction incoherent optical imaging. III. Numerical analysis

Xiao-Jie Tan,Mankei Tsang

DOI: https://doi.org/10.1103/PhysRevA.108.052416

2024-03-29

Abstract:To investigate the fundamental limit to far-field incoherent imaging, the prequels to this work [M. Tsang, Phys. Rev. A 99, 012305 (2019); 104, 052411 (2021)] have studied a quantum lower bound on the error of estimating an object moment and proved a scaling law for the bound with respect to the object size. As the scaling law was proved only in the asymptotic limit of vanishing object size, this work performs a numerical analysis of the quantum bound to verify that the law works well for nonzero object sizes in reality. We also use the numerical bounds to study the optimality of a measurement called spatial-mode demultiplexing or SPADE, showing that SPADE not only follows the scaling but is also numerically close to being optimal, at least for low-order moments.

Quantum Physics

Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit"

Suppression of Quantum Noises in Coherent Atom Lithography Through Squeezing

Sub-diffraction Optical Beam Lithography Based on a Center-Non-zero Depletion Laser

Comment on the Comment on Deformation of Quantum-Mechanics

Comment on "Quantum waveguide array generator for performing Fourier transforms: Alternate route to quantum computing"

On the Relationship between Resolution Enhancement and Multiphoton Absorption Rate in Quantum Lithography

Experimental demonstration of quantum lithography beyond diffraction limit via Rabi oscillations

Comment on Quantum Interference between Light Sources Separated by 150 Million Kilometers Deng et al. PHYSICAL REVIEW LETTERS 123, 080401 (2019)

Comment on Quantum illumination using polarization-entangled photon pairs for enhanced object detection (Opt. Express 32, 40150-40164, 2024)

Single particle strength restoration and nuclear transparency in high Q^2 exclusive (e,e'p) reactions

Quantum Imaging beyond the Diffraction Limit by Optical Centroid Measurements

Direct Laser Writing Breaking Diffraction Barrier Based on Two-Focus Parallel Peripheral Photoinhibition Lithography (vol 4, 066002, 2022)

Exact solutions for one of the extensive chaos model

Towards Non-Degenerate Quantum Lithography

Comment on 'Attosecond electron microscopy and diffraction'

Quantum optical technologies for metrology, sensing and imaging

Beating the spatial standard quantum limits via adiabatic soliton expansion

Comment on “efficient Full-Path Optical Calculation of Scalar and Vector Diffraction Using the Bluestein Method”

Development of Next-Generation Nanolithography Methods to Break the Optical Diffraction Limit

Comment on "large Optical Nonlinearity of Semiconducting Single-Walled Carbon Nanotubes under Resonant Excitations".

Quantum limit to subdiffraction incoherent optical imaging. III. Numerical analysis