Simulating vacuum arc initiation by coupling emission, heating and plasma processes

Roni Koitermaa,Andreas Kyritsakis,Tauno Tiirats,Veronika Zadin,Flyura Djurabekova

DOI: https://doi.org/10.1016/j.vacuum.2024.113176

2024-02-13

Abstract:Vacuum arcing poses significant challenges for high-field vacuum devices, underscoring the importance of understanding it for their efficient design. A detailed description of the physical mechanisms involved in vacuum arcing is yet to be achieved, despite extensive research. In this work, we further develop the modelling of the physical processes involved in the initiation of vacuum arcing, starting from field emission and leading to plasma onset. Our model concurrently combines particle-in-cell with Monte Carlo collisions (PIC-MCC) simulations of plasma processes with finite element-based calculations of electron emission and the associated thermal effects. Including the processes of evaporation, impact ionization and direct field ionization allowed us to observe the dynamics of plasma buildup from an initially cold cathode surface. We simulated a static nanotip at various local fields to study the thresholds for thermal runaway and plasma initiation, identifying the significance of various interactions. We found that direct field ionization of neutrals has a significant effect at high fields on the order of 10 GV/m. Furthermore, we find that cathode surface interactions such as evaporation, sputtering and bombardment heating play a major role in the initiation of vacuum arcs. Consequently, the inclusion of these interactions in vacuum arc simulations is imperative.

Plasma Physics,Materials Science,Computational Physics

What problem does this paper attempt to address?

This paper attempts to address the various physical mechanisms involved in the initiation of vacuum arcs. Specifically, the focus of the study is on the process from field emission to plasma formation in high-field vacuum devices. Despite a large number of experimental and computational studies, a comprehensive understanding of the vacuum arc phenomenon has not yet been achieved. This is because the formation of vacuum arcs involves multiple physical processes that operate on different time and length scales, making detailed study challenging.

The main contribution of the paper is the development of an accurate physical model to describe plasma-surface interactions, leading to the formation of a fully self-sustained plasma near the tip. By combining Particle-in-Cell (PIC) and Monte Carlo Collisions (MCC) simulations of plasma processes with finite element method calculations of electron emission and its associated thermal effects, the researchers were able to observe the dynamic process from the initial cold cathode surface to plasma establishment.

In addition, the paper explores the impact of various interactions (such as evaporation, sputtering, and bombardment heating) on the vacuum arc initiation process and emphasizes the importance of these interactions in vacuum arc simulations. Particularly under high-field conditions (approximately 10 GV/m), direct field ionization has a significant impact on plasma generation. Through these studies, the authors aim to optimize high-field devices to reduce the occurrence of vacuum arcs.