Simulating high-pressure surface reactions with molecular beams

Amjad Al Taleb,Frederik Schiller,Denis V. Vyalikh,José Maria Pérez,Sabine V. Auras,Daniel Farías,J. Enrique Ortega

2023-10-18

Abstract:Using a reactive molecular beam with high kinetic energy ($E_{kin}$) it is possible to speed gas-surface reactions involving high activation barriers ($E_{act}$), which would require elevated pressures ($P_0$) if a random gas with a Maxwell-Boltzmann distribution is used. By simply computing the number of molecules that overcome the activation barrier in a random gas at $P_0$ and in a molecular beam at $E_{kin}$=$E_{act}$, we establish an $E_{kin}$-$P_0$ equivalence curve, through which we postulate that molecular beams are ideal tools to investigate gas-surface reactions that involve high activation energies. In particular, we foresee the use of molecular beams to simulate gas surface reactions within the industrial-range ($>$ 10 bar) using surface-sensitive Ultra-High Vacuum (UHV) techniques, such as X-ray photoemission spectroscopy (XPS). To test this idea, we revisit the oxidation of the Cu(111) surface combining O$_2$ molecular beams and XPS experiments. By tuning the kinetic energy of the O$_2$ beam in the range 0.24-1 eV we achieve the same sequence of surface oxides obtained in Ambient Pressure Photoemission (AP-XPS) experiments, in which the Cu(111) surface was exposed to a random O$_2$ gas up to 1 mbar. We observe the same surface oxidation kinetics as in the random gas, but with a much lower dose, close to the expected value derived from the equivalence curve.

Materials Science

What problem does this paper attempt to address?

The paper primarily discusses how to utilize high-energy molecular beams to accelerate surface reactions, especially those involving high activation energies, which typically require very high pressures to proceed effectively in industrial applications. The author suggests that by tuning the energy of the molecular beams to match the activation energy of the reaction, it is possible to simulate gas-surface reactions within the industrial range (greater than 10 bar) without actually reaching such high pressures, thus overcoming the "pressure gap" issue encountered by Ultra-High Vacuum (UHV) technology when studying such reactions.

Specifically, the paper first introduces the basic steps of heterogeneous catalytic reactions, including chemisorption, surface reaction, and desorption, where the high energy barrier of chemisorption often limits the reaction rate at low temperatures, forcing industrial processes to operate at pressures as high as 100 bar. However, these high-pressure conditions pose a challenge for fundamental research using surface-sensitive analytical techniques (such as X-ray Photoelectron Spectroscopy, XPS) because these techniques perform best in low-pressure environments.

The core idea of the paper is that by adjusting the kinetic energy of the molecular beams to the level of the reaction's activation energy, efficient surface reactions can be achieved at pressures far below industrial standards. To validate this concept, the author revisited the oxidation process on the copper (111) surface, combining oxygen molecular beams with XPS experiments. By adjusting the kinetic energy of the oxygen beam between 0.24 and 1 electron volts, they successfully reproduced the sequence of surface oxides obtained in Ambient Pressure Photoemission (AP-XPS) experiments, but with a dosage far lower than random gas experiments, approaching the values predicted from equivalent curves.

In summary, the paper demonstrates the potential of molecular beams as a tool to simulate high-pressure surface reactions under UHV conditions, particularly when studying gas-surface reactions with high activation energies. This opens up new avenues for the application of XPS technology in the fields of catalysis and surface chemistry.