Using Scalable Computer Vision to Automate High-throughput Semiconductor Characterization

Alexander E. Siemenn,Eunice Aissi,Fang Sheng,Armi Tiihonen,Hamide Kavak,Basita Das,Tonio Buonassisi

DOI: https://doi.org/10.1038/s41467-024-48768-2

2023-11-22

Abstract:High-throughput materials synthesis methods have risen in popularity due to their potential to accelerate the design and discovery of novel functional materials, such as solution-processed semiconductors. After synthesis, key material properties must be measured and characterized to validate discovery and provide feedback to optimization cycles. However, with the boom in development of high-throughput synthesis tools that champion production rates up to $10^4$ samples per hour with flexible form factors, most sample characterization methods are either slow (conventional rates of $10^1$ samples per hour, approximately 1000x slower) or rigid (e.g., designed for standard-size microplates), resulting in a bottleneck that impedes the materials-design process. To overcome this challenge, we propose a set of automated material property characterization (autocharacterization) tools that leverage the adaptive, parallelizable, and scalable nature of computer vision to accelerate the throughput of characterization by 85x compared to the non-automated workflow. We demonstrate a generalizable composition mapping tool for high-throughput synthesized binary material systems as well as two scalable autocharacterization algorithms that (1) autonomously compute the band gap of 200 unique compositions in 6 minutes and (2) autonomously compute the degree of degradation in 200 unique compositions in 20 minutes, generating ultra-high compositional resolution trends of band gap and stability. We demonstrate that the developed band gap and degradation detection autocharacterization methods achieve 98.5% accuracy and 96.9% accuracy, respectively, on the FA$_{1-x}$MA$_{x}$PbI$_3$, $0\leq x \leq 1$ perovskite semiconductor system.

Image and Video Processing,Computer Vision and Pattern Recognition

What problem does this paper attempt to address?

### Problems the Paper Aims to Solve

This paper aims to address the bottleneck issues in material characterization during the high-throughput material synthesis process. Specifically:

1. **High-throughput Material Synthesis**: With the development of high-throughput material synthesis technology, researchers can synthesize new materials at a rate of thousands of samples per hour. However, existing material characterization methods are either slow (traditional methods can only process about 100 samples per hour) or too rigid (e.g., only applicable to standard-sized microplates), leading to bottlenecks in the material design process.

2. **Automated Characterization Tools**: To overcome this challenge, the authors propose a set of automated material characterization tools based on computer vision (autocharacterization). These tools leverage the adaptability, parallelization, and scalability of computer vision to significantly improve the throughput of material characterization. Specific applications include:
- Automatically detecting and segmenting a large number of non-uniform material samples.
- Mapping the composition of high-throughput synthesized material systems.
- Automatically calculating band gaps and environmental stability.

3. **Performance Validation**: The paper demonstrates the performance of this method on 200 unique high-throughput manufactured FA_1-xMA_xPbI₃ perovskite semiconductor samples, generating ultra-high-resolution band gap and stability trend maps. The results show that the band gap autocharacterization method achieved an accuracy of 98.5%, while the degradation detection method achieved an accuracy of 96.9%.

By developing these automated characterization tools, the authors address the bottleneck issues encountered in high-throughput material discovery and optimization with traditional methods, significantly enhancing the efficiency and accuracy of material screening.