Effect of substrate and substrate temperature on microstructure of magnetron sputtering doped-ZnO thin films
G. Roymahapatra,Himadri Sekhar Das,R. Das,P. Nandi
Abstract:Introduction In recent time, transparent conducting oxide (TCO) films is a major interesting research subject, due to its wide use in optoelectronic devices such as low-emissivity windows, electromagnetic shielding, gas sensors, information displays, and photovoltaic cells. SnO2 and ITO (Indium tin oxide) are the commercially available transparent conductive oxide thin films1,2 at present, but indium is a rare metal with high toxicity. Doped ZnO thin film is considered to be the most promising material as TCO thin films for its high optical transmittance (> 90%) and very low electrical resistivity (in the order of 10–5 -cm). ZnO thin film can be deposited in either physical or chemical vapor deposition techniques such as; sol-gel method, spray pyrolysis, pusled laser deposition, thermal evaporation, molecular beam Epitaxy and RF magnetron sputtering3–6. RF magnetron sputtering technique is mostly preferred due to its reproducibility, high orientation and uniformity in films. Non-toxicity, high crystallinity and stability J. Indian Chem. Soc., Vol. 97, No. 11a, November 2020, pp. 2180-2187
Physics,Engineering,Materials Science