Anodized lamellar Ni-Ni 3 Si template for electrodeposition of micro-nanostructures
Zhi Zheng,Zhilong Zhao,Luge Yuan,Yang Liu,Hong Yang,Kai Cui
DOI: https://doi.org/10.1016/j.jallcom.2023.172290
IF: 6.2
2023-09-29
Journal of Alloys and Compounds
Abstract:The lamellar Ni-Ni 3 Si template has the potential for various applications, such as magnetic arrays, layered magnetoelectric materials, electrode materials, and supercapacitors via electrodeposition. However, accurately electrodepositing other materials within the microchannels of the lamellar Ni-Ni 3 Si template remains a challenge. In this work, the lamellar Ni-Ni 3 Si template was anodized in 0.1 M oxalic acid (H 2 C 2 O 4 ) to achieve accurate deposition of other materials within the microchannels of the lamellar Ni-Ni 3 Si template. After anodization, the non-anodized and anodized lamellar Ni-Ni 3 Si templates were subjected to various characterization techniques, including electrochemical impedance spectroscopy, Mott-Schottky analysis, X-ray diffraction and X-ray photoelectron spectroscopy. The study revealed that the optimal anodization potential is 1.2 V SCE , which generated a double-layer passivation film mainly comprised of Ni(OH) 2 and SiO 2 , with a small amount of NiO and Ni 2 SiO 4 . Furthermore, cobalt was electrodeposited on non-anodized and anodized lamellar Ni-Ni 3 Si templates. The results showed that the passive film of the anodized lamellar Ni-Ni 3 Si template effectively inhibits cobalt nucleation on the surface and sidewalls of the β-Ni 3 Si sheets and facilitates cobalt deposition within the microchannels. This work provides a novel lamellar metallic template for the electrodeposition of micro-nanostructures.
materials science, multidisciplinary,chemistry, physical,metallurgy & metallurgical engineering