Wide range tunable bandgap and composition β -phase (AlGa) 2 O 3 thin film by thermal annealing

Che-Hao Liao,Kuang-Hui Li,Carlos G. Torres-Castanedo,Guozheng Zhang,Xiaohang Li
DOI: https://doi.org/10.1063/5.0027067
IF: 4
2021-01-18
Applied Physics Letters
Abstract:We have demonstrated wide bandgap and composition range <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> thin films by employing thermal annealing of <i>β</i>-Ga<sub>2</sub>O<sub>3</sub>/sapphire templates. With proper annealing conditions at 1000–1500 °C, the <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> thin films transformed to the <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> thin films with different bandgaps and compositions due to the Al diffusion from sapphire. Meanwhile, the Ga atoms diffused into sapphire. The interdiffusion process caused an increased film thickness, which was enhanced in proportion to the annealing temperature. It was confirmed by secondary ion mass spectrometry (SIMS) and transmission electron microscopy. Thus, higher temperatures resulted in high Al contents in the <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> films. Also, the SIMS measurements show highly homogeneous Al contents throughout the <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> films annealed at 1200 °C and above. Evaluated by x-ray diffraction (XRD), the Al content range of the samples is 0–0.81 for the <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> templates without annealing and with annealing up to 1500 °C. Evaluated by UV-Vis spectroscopy, the optical bandgap range of the samples is 4.88–6.38 eV for the <i>β</i>-Ga<sub>2</sub>O<sub>3</sub> templates without annealing and with annealing up to 1400 °C, translating to the Al content range of 0–0.72. Moreover, the crystal quality of <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> improved as the Al composition became larger due to higher annealing temperatures. The proposed technique is promising for the preparation of <i>β</i>-(Al<sub>x</sub>Ga<sub>1−x</sub>)<sub>2</sub>O<sub>3</sub> thin films without employing "direct-growth" techniques.
physics, applied
What problem does this paper attempt to address?