Abstract:Time- and angle-resolved photoelectron spectroscopy (trARPES) employing a 500 kHz extreme-ultravioled (XUV) light source operating at 21.7 eV probe photon energy is reported. Based on a high-power ytterbium laser, optical parametric chirped pulse amplification (OPCPA), and ultraviolet-driven high-harmonic generation, the light source produces an isolated high-harmonic with 110 meV bandwidth and a flux of more than $10^{11}$ photons/second on the sample. Combined with a state-of-the-art ARPES chamber, this table-top experiment allows high-repetition rate pump-probe experiments of electron dynamics in occupied and normally unoccupied (excited) states in the entire Brillouin zone and with a temporal system response function below 40 fs.

What problem does this paper attempt to address?

The problem that this paper attempts to solve is to develop a new experimental device for time - resolved and angle - resolved photoemission spectroscopy (trARPES) research. Specifically, the author describes an experimental setup based on a new type of light source that operates in the extreme ultraviolet (XUV) range, with a repetition rate of 500 kHz and a probe photon energy of 21.7 eV. This light source is achieved through a high - power ytterbium laser, optical parametric chirped - pulse amplification (OPCPA) technology, and ultraviolet - driven high - order harmonic generation technology. Combined with an advanced ARPES chamber, this table - top experimental device is capable of conducting high - repetition - rate pump - probe experiments to study the electron dynamics of occupied and unoccupied (excited) states in the entire Brillouin zone in materials, and the system response function is less than 40 femtoseconds. ### Main problems 1. **Increasing the repetition rate**: Traditional trARPES experiments are limited by a relatively low repetition rate, which restricts the speed of data accumulation and experimental efficiency. The method proposed in this paper increases the repetition rate to 500 kHz through the use of OPCPA technology, significantly improving the efficiency of the experiment. 2. **Expanding the observation range**: A light source with low photon energy can only observe the area near the center of the Brillouin zone. The high - photon - energy light source (21.7 eV) proposed in this paper can observe a wider reciprocal space, thus providing more comprehensive electronic structure information. 3. **Improving the time resolution**: By optimizing the experimental device, a system response function of less than 40 femtoseconds has been achieved, which is crucial for studying ultrafast electron dynamics. ### Solutions 1. **Light source design**: - Use a ytterbium laser and OPCPA technology to generate near - infrared (NIR) light with a high repetition rate (500 kHz). - Convert NIR light into 21.7 eV XUV light through ultraviolet - driven high - order harmonic generation technology. - Achieve efficient high - order harmonic generation through a high - pressure gas target and a tightly focused geometry. 2. **Beamline design**: - Use a silicon Brewster plate and a multilayer mirror to reflect XUV light while absorbing most of the fundamental frequency light. - Select a specific high - order harmonic (the 7th harmonic) through a transmissive tin - foil filter and suppress the interference of adjacent harmonics. - Design multiple filters and spectrometers to characterize the spectrum and intensity of XUV light. 3. **Experimental chamber design**: - Combine an advanced ARPES chamber to achieve measurements with high time resolution and momentum resolution. - The sample is mounted on a 6 - axis manipulator and can be measured under liquid - helium cooling. - The ultra - high - vacuum environment in the experimental chamber ensures the stability of the sample and the reliability of the data. Through these designs, this experimental device can perform efficient time - resolved and angle - resolved photoemission spectroscopy measurements at a high repetition rate, providing a powerful tool for studying ultrafast electron dynamics in materials.

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