Abstract:Microplasmas are used for technology applications, electron microscopy for micro‐ to nanoscale analyses. Combining them gives new insights into plasma‐sample interactions. This work presents a microplasma setup in a scanning electron microscope. Real‐time imaging during plasma operation and its effect on the sample are shown. This provides new capabilities for plasma and materials science, for example, modification on the micrometer scale. Microplasmas can be used for a wide range of technological applications and to improve the understanding of fundamental physics. Scanning electron microscopy, on the other hand, provides insights into the sample morphology and chemistry of materials from the mm‐ down to the nm‐scale. Combining both would provide direct insight into plasma‐sample interactions in real‐time and at high spatial resolution. Up till now, very few attempts in this direction have been made, and significant challenges remain. This work presents a stable direct current glow discharge microplasma setup built inside a scanning electron microscope. The experimental setup is capable of real‐time in situ imaging of the sample evolution during plasma operation and it demonstrates localized sputtering and sample oxidation. Further, the experimental parameters such as varying gas mixtures, electrode polarity, and field strength are explored and experimental V–I curves under various conditions are provided. These results demonstrate the capabilities of this setup in potential investigations of plasma physics, plasma‐surface interactions, and materials science and its practical applications. The presented setup shows the potential to have several technological applications, for example, to locally modify the sample surface (e.g., local oxidation and ion implantation for nanotechnology applications) on the μm‐scale.

Plasma Generation by Household Microwave Oven for Surface Modification and Other Emerging Applications

Plasma generation by household microwave oven for surface modification and other emerging applications

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