Abstract:A new approach has been developed for making near-real-time measurement of elemental composition of aerosols using plasma spectroscopy. The method allows preconcentration of miniscule particle mass (pg to ng) directly from the sampled aerosol stream through electrostatic deposition of charged particles (30-900 nm) onto a flat-tip microneedle electrode. The collected material is subsequently ablated from the electrode and monitored by laser-induced breakdown spectroscopy. Atomic emission spectra were collected using a broadband spectrometer with a wavelength range of 200-980 nm. A single-sensor delay time of 1.3 μs was used in the spectrometer for all elements to allow simultaneous measurement of multiple elements. The system was calibrated for various elements including Cd, Cr, Cu, Mn, Na, and Ti. The absolute mass detection limits for these elements were experimentally determined and found to be in the range of 0.018-5 ng. The electrostatic collection technique has many advantages over other substrate-based methods involving aerosol collection on a filter or its focused deposition using an aerodynamic lens. Because the particle mass is collected over a very small area that is smaller than the spatial extent of the laser-induced plasma, the entire mass is available for analysis. This considerably improves reliability of the calibration and enhances measurement accuracy and precision. Further, the aerosol collection technique involves very low pressure drop, thereby allowing higher sample flow rates with much smaller pumps-a desirable feature for portable instrumentation. Higher flow rates also make it feasible to measure trace element concentrations at part per trillion levels. Detection limits in the range of 18-670 ng m-3 can be achieved for most of the elements studied at a flow rate of 1.5 L min-1 with sampling times of 5 min.

The Benefit of Wide Energy Range Spectrum Acquisition During Sputter Depth Profile Measurements

Vacuum Quality Monitoring of Analytical Sputter Depth Profile Equipment by Recontamination Measurements of a Sputtered Ti Surface

Use of Photoelectron Energy Spectrum Transfer Equation for the Measurement of a Narrowband XUV Pulse

Sputter-Induced Cross-Contaminations in Analytical AES and XPS Instrumentation: Utilization of the effect for the In-situ Deposition of Ultrathin Functional Layers

Depth resolution optimized sputter depth profiling of a polycrystalline Al layer

Single-Shot White-Light Dispersive Interferometric Profilometer

Femtosecond laser ablation (fs-LA) XPS – A novel XPS depth profiling technique for thin films, coatings and multi-layered structures

Angle and Energy Dispersive Multichannel Electron Energy Spectrometer for Surface Analysis

XPS for non-destructive depth profiling and 3D imaging of surface nanostructures

Sub‐Nanometer Depth Profiling of Native Metal Oxide Layers Within Single Fixed‐Angle X‐Ray Photoelectron Spectra

Simultaneous ambient pressure x-ray photoelectron spectroscopy and grazing incidence x-ray scattering in gas environments

Reference-free evaluation of thin films mass thickness and composition through energy dispersive X-ray spectroscopy

In situ XRD measurements to explore phase formation in the near surface region

Accurate argon cluster-ion sputter yields: Measured yields and effect of the sputter threshold in practical depth-profiling by x-ray photoelectron spectroscopy and secondary ion mass spectrometry

XPS depth profiling of nano-layers by a novel trial-and-error evaluation procedure

Introduction to lateral resolution and analysis area measurements in XPS

Picometer-Sensitivity Surface Profile Measurement Using Swept-Source Phase Microscopy

A Proximal Retarding Field Analyzer for Scanning Probe Energy Loss Spectroscopy

New Approach for Near-Real-Time Measurement of Elemental Composition of Aerosol Using Laser-Induced Breakdown Spectroscopy

Experimental setups for XPS measurements beyond the instrumental lateral resolution limit

Surface science insight note: Imaging X‐ray photoelectron spectroscopy