Growth mechanism of cluster-assembled surfaces: from sub-monolayer to thin film regime

Francesca Borghi,Alessandro Podestà,Claudio Piazzoni,Paolo Milani

DOI: https://doi.org/10.1103/PhysRevApplied.9.044016

2018-03-21

Abstract:Nanostructured films obtained by the assembling of preformed atomic clusters are of strategic importance for a wide variety of applications. The deposition of clusters produced in the gas phase onto a substrate offers the possibility to control and engineer the structural and functional properties of the cluster-assembled films. To date the microscopic mechanisms underlying the growth and structuring of cluster-assembled films are poorly understood, and in particular the transition from the sub-monolayer to the thin film regime is experimentally unexplored. Here we report the systematic characterization by Atomic Force Microscopy of the evolution of the structural properties of cluster-assembled films deposited by Supersonic Cluster Beam Deposition. As a paradigm of nanostructured systems, we have focused our attention on cluster-assembled zirconia films, investigating the influence of the building blocks dimensions on the growth mechanisms and on the roughening of the thin films, following the growth process from the early stages of the sub-monolayer to the thin film regime. Our results demonstrate that the growth dynamics in the sub-monolayer regime determines different morphological properties of the cluster-assembled thin film. The evolution of roughness with the number of deposited clusters reproduces exactly the growth exponent of the ballistic deposition in the 2+1 model, from the sub-monolayer to the thin film regime.

Mesoscale and Nanoscale Physics

What problem does this paper attempt to address?

The problem that this paper attempts to solve is to understand the microscopic mechanisms in the growth process of nanostructured thin films from the sub - monolayer to the thin - film region, especially zirconia (ZrO₂) thin films prepared by Supersonic Cluster Beam Deposition (SCBD) technology. Specifically, the authors focus on the following aspects:

1. **Growth Mechanism**: Study the formation and evolution mechanisms of nanostructured thin films during the transition from the sub - monolayer to the thin - film region.
2. **Surface Morphology Evolution**: Explore the influence of building blocks (i.e., atomic clusters) of different sizes on the thin - film growth mechanism and its surface roughness.
3. **Theoretical Model Verification**: Verify whether the existing theoretical models (such as the ballistic deposition model of spheres, the diffusion - aggregation model, etc.) are suitable for describing the growth process of atomic - cluster - assembled thin films.

### Main Content of the Paper

#### 1. Introduction
The paper first introduces the importance of nanostructured thin films in various applications, such as microelectronics, photonics, energy conversion, and biomedicine. Traditional thin - film manufacturing techniques are mainly based on the precise assembly of atoms or molecules, while the Cluster Beam Deposition (CBD) technology provides a new method that can use pre - formed atomic clusters to assemble nanostructured thin films. The advantage of this technology lies in its ability to maintain the characteristics of nano - scale building blocks, thereby achieving precise control of thin - film characteristics.

#### 2. Experimental Methods
The authors prepared nanostructured zirconia (ns - ZrO₂) thin films using Supersonic Cluster Beam Deposition (SCBD) technology and systematically characterized their morphology by Atomic Force Microscopy (AFM). In the experiment, the authors studied the influence of different carrier gases (helium and argon) on the deposition effect and analyzed the changes in sample morphology at different coverages.

#### 3. Results and Discussion
By analyzing the AFM images of thin films at different coverages, the authors reached the following conclusions:
- **Transition from Sub - monolayer to Thin - Film Region**: As the coverage increases, the surface morphology of the thin film gradually evolves from discrete atomic clusters to interconnected island - like structures and finally forms a uniform thin film.
- **Change in Surface Roughness**: The surface roughness (Rq) changes with the increase in coverage and is in line with the prediction of the ballistic deposition model of spheres.
- **Growth Kinetics**: Large - sized atomic clusters play a major role in increasing the surface coverage, indicating that these large clusters have an important influence on the formation of thin - film morphology in the early stage.

#### 4. Theoretical Model
The authors used the Diffusion - Deposition - Aggregation (DDA) model to describe the growth process of atomic - cluster - assembled thin films. The results show that the DDA model can well explain the experimental data, especially when considering pulsed deposition and a wide distribution of atomic - cluster sizes.

### Summary
This paper reveals the microscopic mechanisms in the growth process of nanostructured thin films from the sub - monolayer to the thin - film region through systematic experimental and theoretical analyses. The research results not only help to understand the growth kinetics of atomic - cluster - assembled thin films but also provide theoretical basis and technical support for the development of new nanostructured materials.

### Key Formulas
- Formula for calculating surface roughness (Rq):
\[
R_q=\sqrt{\frac{1}{N}\sum_{i,j}(h_{i,j}-\bar{h})^2}
\]
where \(h_{i,j}\) is the height value, \(\bar{h}\) is the average height, and \(N\) is the total number of pixels.

- Formula for the evolution of surface coverage (\(\theta\)) with time:
\[
\theta = 1 - e^{-\left(\frac{fD_m^2}{4}\right)t}
\]
where \(f\) is the average flux, \(D_m\) is the diameter of the initially deposited cluster, and \(t\) is the deposition time.

Through these studies, the authors provide important scientific basis for understanding the growth mechanisms of nanostructured thin films.