High-Resolution Hard X-ray Holography by Unconfined Atomic Layer Deposited Phase-Shifting 3D References

Mirna Saliba,Jeroen Bosgra,Christoph Rau,Christian David,Aaron D. Parsons,Ulrich H. Wagner,Pierre Thibault
DOI: https://doi.org/10.48550/arXiv.1607.07690
2016-10-14
Abstract:We demonstrate high-resolution non-iterative holographic coherent diffraction imaging with hard X-rays using a novel phase-shifting reference, fabricated by atomic layer deposition to produce nanosharp 3D structure. The method surpasses the limitations associated with absorbing substrates predominantly employed in soft X-ray holography using extended, customized and point-source references. The unconfined experimental setup relaxes the technical constraints, allows effective data correction, and enables independent sample translation and rotation for data averaging and tomography. Applicable to single-shot measurements, phase and amplitude reconstructions of samples are retrieved with single-pixel resolution and differential contrast by simple non-iterative computation.
Mesoscale and Nanoscale Physics
What problem does this paper attempt to address?
The main problem that this paper attempts to solve is to develop a new method for high - resolution holographic coherent diffraction imaging of hard X - rays, in order to overcome the limitations brought by the absorption substrate in traditional soft X - ray holographic techniques. Specifically, the authors introduced a new type of phase - shift 3D reference structure, fabricated by Atomic Layer Deposition (ALD) technology, with nanoscale sharp edges. This method not only improves the resolution and contrast of imaging, but also relaxes the technical constraints of the experimental setup, and allows independent translation and rotation of the sample, thereby achieving data averaging and tomography. ### Main Problems and Solutions 1. **Improve the Resolution and Contrast of Hard X - ray Holographic Imaging**: - Traditional soft X - ray holographic imaging relies on an absorption substrate, which is difficult to achieve under hard X - ray conditions because very thick materials are required to completely absorb X - rays. - The authors propose using a phase - shift reference structure instead of an absorption/transmission mask. This structure utilizes the sharp change in phase at the edge to generate a boundary wave, thus providing high - contrast and high - resolution images. 2. **Overcome Manufacturing Limitations**: - The phase - shift reference structure fabricated by Atomic Layer Deposition technology can precisely control the deposition of materials on the sub - nanometer scale, thereby obtaining higher edge sharpness than traditional electron - beam or ion - beam etching. - The manufacturing process of this new type of reference structure enables high - resolution and high - contrast imaging even under hard X - ray conditions. 3. **Relax the Technical Constraints of the Experimental Setup**: - The new reference structure design allows physical separation of the sample and the reference plane, thereby providing more degrees of freedom, such as independent translation and rotation of the sample. - This unconstrained experimental setup simplifies the data correction process and enables more effective data averaging and tomography. 4. **Direct, Non - iterative Reconstruction in a Single Measurement**: - Through simple non - iterative calculations, high - resolution reconstructions of the sample phase and amplitude can be directly obtained from a single - measurement data set, while achieving differential contrast and edge - contrast enhancement. ### Technical Details - **Design of the Phase - shift Reference Structure**: Silicon pillars are used as the substrate, and the surface is covered with a 10 - nm - thick layer of iridium (Ir) to form a square - box - shaped reference structure. This structure exhibits a π phase shift under X - ray irradiation but has almost no absorption, thereby significantly enhancing the reference signal strength. - **Experimental Setup**: The experiment was carried out on the I13 - 1 coherent beamline at Diamond Light Source, using a 9.1 - keV monochromatic X - ray beam, and the positions of the sample and the reference structure were controlled by a piezoelectric stage with nanometer - level precision. - **Data Processing**: Holographic diffraction patterns are processed through computational tools such as Inverse Fourier Transform (IFFT), Linear Differential Operator (LDO), and near - field propagation, and finally high - resolution reconstructed images of the sample are obtained. ### Conclusion This research shows how to achieve high - resolution, high - contrast holographic imaging under hard X - ray conditions through innovative phase - shift reference structure design and advanced manufacturing techniques. This method not only improves the imaging quality but also provides new possibilities for future research, especially in application fields that require high penetration depth and low scattering, such as medical imaging, archaeology, semiconductors, and materials science.