Abstract:The development of real-time control strategies for key discharge parameters, such as densities, fluxes, and energy distributions, is of fundamental interest to many plasma sources. Over the last decade, multi-harmonic 'tailored' voltage waveforms have been successfully employed to achieve enhanced control of key parameters in a wide range of radio-frequency (RF) plasma sources through application of the electrical asymmetry effect (EAE). More recently, the analogous magnetic asymmetry effect (MAE) has been numerically and experimentally demonstrated to achieve a notable degree of control in parallel plate RF plasma sources. The MAE is achieved via selectively magnetising the charged species adjacent to one electrode, altering the charge flux to the surface and enforcing a DC self-bias to maintain quasineutrality. This study addresses the degree of control achieved by the MAE in a non-planar geometry via 2D fluid/kinetic simulations of a magnetised RF capacitively coupled plasma (RF-CCP) source employing two different magnetic topologies. The simultaneous application of the EAE and MAE is then presented for the same geometry, demonstrating a degree of non-linear behaviour dependant upon the applied magnetic topology. Control of the DC self-bias voltage ηDC is demonstrated for a single 600 Vpp, 13.56 MHz discharge in both 'convergent' (maximum on-axis field strength) and 'divergent' (minimum on-axis field strength) magnetic topolgies. MAE induced modulations of ηDC = 0.13 Vpp and ηDC = 0.03 Vpp are achieved for each magnetic topology, respectively, for magnetic field strengths between 50 - 1000 G. Simultaneous application of an EAE and MAE is achieved through a multi-harmonic 'peak'-type tailored voltage waveform employing varying harmonic phase offsets between 0◦ ≤ θ ≤ 360◦ . The degree to which the DC self-bias voltage is modulated by the applied EAE is mediated by the orientation and magnitude of the applied magnetic field. The EAE induced DC self-bias modulations exhibit non-linear behaviour in response to a superimposed MAE, such that the resulting DC self-bias differs from an additive combination of the two effects alone Simultaneous application of the electrical and magnetic asymmetry effects offers the possibility of further decoupling ion and electron dynamics in RF plasma sources, and represents an improvement over each approach in isolation.

Self-bias Dependence on Process Parameters in Asymmetric Cylindrical Coaxial Capacitively Coupled Plasma

Reversal of the Asymmetry in a Cylindrical Coaxial Capacitively Coupled Ar/Cl2 Plasma

Study on DC Self-Bias of High Density RF Plasma Source Etching Process

Tailored-waveform excitation of capacitively coupled plasmas and the electrical asymmetry effect

2D particle-in-cell simulations of geometrically asymmetric low-pressure capacitive RF plasmas driven by tailored voltage waveforms

Implicit and electrostatic Particle-in-cell/Monte Carlo model in two dimensional and axisymmetric geometry II: Self-bias voltage effects in capacitively coupled plasmas

Hybrid simulation of radio frequency biased inductively coupled Ar/O 2 /Cl 2 plasmas

Discharge characteristics of a low-pressure geometrically asymmetric cylindrical capacitively coupled plasma with an axisymmetric magnetic field

Plasma Processing of Large Curved Surfaces for SRF Cavity Modification

Influence of Dc Bias Voltage on the Refractive-Index and Stress of Carbon-Diamond Films Deposited from A Ch4/Ar Rf Plasma

Spontaneous asymmetry effect induced by uniform magnetic fields in capacitively coupled plasmas under perfectly symmetric conditions

Magnetic enhancement of the electrical asymmetry effect in capacitively coupled plasmas

The effects of electron surface interactions in geometrically symmetric capacitive RF plasmas in the presence of different electrode surface materials

Investigating Instabilities in Magnetized Low-pressure Capacitively-Coupled RF Plasma using Particle-in-Cell (PIC) Simulations

Self-Sustained Criterion with Photoionization for Positive Dc Corona Plasmas Between Coaxial Cylinders

Ion energy distribution function in very high frequency capacitive discharges excited by sawtooth waveform

Electron heating and control of ion properties in capacitive discharges driven by customized voltage waveforms

On the in-situ determination of the effective secondary electron emission coefficient in low pressure capacitively coupled radio frequency discharges based on the electrical asymmetry effect

Experimental studies and COMSOL 1-D simulation in Ar capacitively coupled plasmas

Simulation of Dual-Electrode Capacitively Coupled Plasma Discharges

Hybrid simulation of instabilities in capacitively coupled RF CF 4 /Ar plasmas driven by a dual frequency source