ADVANCEMENTS IN DISPLACEMENT METROLOGY BASED ON ENCODER SYSTEMS

J. Heidenhain,Holzapfel,W. Holzapfel
Abstract:Production equipment for semiconductors and optical components most often contain stages with high demands on positioning or scanning. Dedicated optical feedback sensors such as laser interferometers or interferential grating encoders [1] with sub-nanometer resolutions are applied there. In most applications critical measurements are performed over small distances within short time intervals. This article highlights the current status of interferential grating encoder technology.
Physics,Engineering
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