Silyl- and Germyl-Substituted Boranes: Synthesis and Investigation as Potential Atomic Layer Deposition Precursors

Majeda Al Hareri,Patricio Romero,James F. Britten,David J. H. Emslie
DOI: https://doi.org/10.1021/acs.inorgchem.4c03416
IF: 4.6
2024-10-22
Inorganic Chemistry
Abstract:Boranes featuring bulky hypersilyl or supersilyl groups and/or sterically unencumbered trimethylgermyl substituents were synthesized for investigation as potential precursors for atomic layer deposition (ALD) of elemental boron. The envisaged ALD process would employ a boron trihalide coreactant, exploiting the formation of strong silicon-halogen and germanium-halogen bonds as a driving force. The alkali metal silyl and germyl compounds hypersilyl lithium, {(Me(3)Si)(3)Si}Li(THF)(3) (1),...
chemistry, inorganic & nuclear
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