Influence of gas ambient on charge writing at the LaAlO3/SrTiO3 heterointerface

Haeri Kim,Seon Young Moon,Shin-Ik Kim,Seung-Hyub Baek,Ho Won Jang,Dong-Wook Kim
DOI: https://doi.org/10.1021/am503367f
2014-02-22
Abstract:We investigated the influences charge writing on the surface work function and resistance of the LaAlO3/SrTiO3 (LAO/STO) heterointerface in several gas environments (air, O2, N2, and H2/N2). Charge writing decreased the surface work function and resistance of the LAO/STO sample quite a lot in air but slightly in <a class="link-external link-http" href="http://O2.The" rel="external noopener nofollow">this http URL</a> interface carrier density was extracted from the measured sheet resistance and compared with that obtained from the proposed charge-writing mechanisms, such as carrier transfer via surface adsorbates and surface redox. Such quantitative analyses suggested that additional processes (e.g., electronic state modification and electrochemical surface reaction) were required to explain charge writing on the LAO/STO interface.
Materials Science,Mesoscale and Nanoscale Physics,Strongly Correlated Electrons
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