Surfactant enhanced antiferromagnetic coupling in magnetron sputtered Cu/Co multilayers: A neutron reflectivity study

S. M. Amir,Mukul Gupta,Ajay Gupta,J. Stahn

DOI: https://doi.org/10.48550/arXiv.1209.5330

2012-09-25

Abstract:In this work we studied Cu/Co multilayers prepared using dc-magnetron sputtering technique with Ag surfactant. It was found that Ag balances the difference in the surface free energy of Cu and Co and this results in removing the asymmetry in the interface roughness of Cu-on-Co and Co-on-Cu interfaces. As the interfaces become symmetric, we observe a significant enhancement in antiferromagnetic coupling and magneto resistance. Further, a correlation of spin-dependent scattering with the interface roughness is brought by comparing Cu/Co multilayer prepared using different deposition methods. It was found that as interface roughness increases spin-dependent scattering decreases.

Mesoscale and Nanoscale Physics,Materials Science