A novel analytical approach to describe the simultaneous diffusional growth of multilayer stoichiometric compounds in binary reactive diffusion couples

Ma,Fangzhou Xing,Chunming Deng,Lijun Zhang,Sa Ma
DOI: https://doi.org/10.1016/j.scriptamat.2020.09.025
IF: 6.302
2021-01-01
Scripta Materialia
Abstract:<p>In this paper, we developed a novel analytical approach for description of the diffusion-controlled simultaneous growth of multilayer stoichiometric compounds in binary reactive diffusion couples. The approach was directly extended to describe the compounds with narrow/certain homogeneity ranges. The models were then applied to three different real cases in technically important Co–Si and Cu–In binary systems. The predicted thickness curves/composition profiles revealed a satisfactory agreement with all the experimental data. The successful applications indicate that the approach can serve as an efficient way for describing the multi-layer growth in the joining, coating, and solar cell industries.</p>
materials science, multidisciplinary,nanoscience & nanotechnology,metallurgy & metallurgical engineering
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