Adsorption and Diffusion Behavior of Xe/Kr Gas on Al2O3 and Stilbene Surface

Jingxiao Wang,Qianhao Lan,Fei Luo,Qian Wang,Hongyan Wang
DOI: https://doi.org/10.1134/s0036024424050133
2024-06-02
Russian Journal of Physical Chemistry A
Abstract:The adsorption and diffusion behavior of radioactive inert gases, xenon (Xe) and krypton (Kr), on flat and rough surfaces of Al 2 O 3 and stilbene, were investigated using molecular dynamics (MD) simulations based on the compass force field. The diffusion coefficients of Xe/Kr were determined from the root mean square displacement (MSD) of the inert gas adsorption curves. The results indicate that Xe/Kr gas can stably adsorb on the Al 2 O 3 and stilbene surface, and the Xe's adsorption is stronger than Kr's on both surfaces. The adsorption energies increase with the thickness of the stilbene substrate, whereas they decrease for the Al 2 O 3 substrate. The inert gases' adsorption performance and diffusion coefficient on rough stilbene surfaces are significantly increased; however, the surface roughness has little effect on the Al 2 O 3 adsorption performance. The study can guide the design of highly sensitive scintillators with low backgrounds.
chemistry, physical
What problem does this paper attempt to address?