Density functional calculations of diffusion paths of CH 3 S ad on c(2×2)-Cl and -Br covered Cu(100) surfaces

Falk Wendorff,Eckhard Pehlke
DOI: https://doi.org/10.1039/d4cp03884c
IF: 3.3
2024-11-28
Physical Chemistry Chemical Physics
Abstract:Identification of the atomic-scale mechanisms of surface diffusion at interfaces covered by co-adsorbates is relevant for understanding electrochemical processes at these interfaces. The surface dynamics of CH 3 S ad on c(2×2)-Cl covered Cu(100) surfaces has been studied with video-STM in electrochemical environment by Yang, Taranowski, and Magnussen [ Langmuir , 2012, 28 , 14143]. We present density functional calculations to predict diffusion paths and energy barriers of CH 3 S ad substitutionally adsorbed on c(2×2)-Cl or -Br covered Cu(100) surfaces and compare them to the case of S ad . Additional vacancies in the halogen adlayer enable further diffusion paths with significantly lower DFT energy barriers ( i.e. energy barriers in case of uncharged surfaces vs. vacuum). We argue that at least in case of Cl-covered surfaces this preference for vacancy-assisted diffusion of CH 3 S ad persists when the energy for creating a Cl-vacancy is accounted for. However, we have not yet been able to include the effect of the electric field on the computed energy barriers for this system, which might affect the preferred diffusion mechanism.
chemistry, physical,physics, atomic, molecular & chemical
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