Abstract:Abstract We investigated capacitively coupled Ar/C 2 H 2 RF plasmas with a 1D fluid model that couples a 13.56 MHz discharge module, a long timescale chemical module and a flow transport module. A new solution procedure was developed in order to accurately describe the coupling between the short timescale discharge dynamics and the long characteristic time processes that play a major role in the molecular growth of reactive species. The plasma was simulated for different inlet gas configurations and flowrates. We showed that for a showerhead configuration one may distinguish two situations. For short residence time the plasma was strongly electronegative in the very center of the discharge gap and dominated by large hydrocarbon positive and negative ions. In this situation the acetylene conversion, although moderate, lead to a significant molecular growth. For long residence time, although C 2 H 2 underwent a total conversion, the products of the primary C 2 H 2 dissociation process were consumed by surface deposition which reduced drastically the molecular growth in the short gap discharge considered here. Whatever the conditions, we confirmed the key-role of Ar* in the acetylene conversion, ionization kinetics as well as the subsequent molecular growth for neutral and charged species. We also showed that remote feed gas and showerhead configurations predicted similar results at low flowrate. At larger flowrate the two configurations presented some discrepancy. Especially H 2 density was much larger for the remote feed gas configuration, which affected the overall plasma behavior. Our results highlight that realistic gas-flow models are essential for an accurate description of acetylene conversion in Ar/C 2 H 2 plasma.

Acetylene - Argon Plasmas Measured at a Biased Substrate Electrode for Diamond-Like Carbon Deposition. Part 1: Mass Spectroscopy

Characterization of A-C:H:n Deposition from CH4/N2 Rf Plasmas Using Optical Emission Spectroscopy

Discharge dynamics, plasma kinetics and gas flow effect in argon–acetylene discharges

Diagnostics of CH/sub 4/ plasmas used for diamond-like carbon deposition

Diagnosis of Active Species in Reactive Acetylene Plasma by Laser-Ionization Molecular-Beam Time-of-Flight Mass Spectrometry

Influence of Dc Bias Voltage on the Refractive-Index and Stress of Carbon-Diamond Films Deposited from A Ch4/Ar Rf Plasma

Optical Spectroscopy Diagnosis of Methane Plasma Generated with Atmospheric Pressure Jet

Plasma Composition During Plasma-Enhanced Chemical Vapor Deposition of Carbon Nanotubes

Diagnostics of Plasma Emission Spectra During Electron Assisted Chemical Vapor Deposition of Diamond Films

Spectroscopic Study on the Evolution of Graphite Ablation Plume in ECR Argon Plasma During the Deposition of Diamond-Like Carbon Films

Correlation of Gas-Phase Composition with Film Properties in the Plasma-Enhanced Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films

Diamond-like Carbon Thin Films Prepared by ECR Argon Plasma Assisted Pulsed Laser Deposition

Studies of laminar opposed-flow diffusion flames of acetylene at low-pressures with photoionization mass spectrometry

Deposition of Tetrahedral Hydrogenated Amorphous Carbon Using a Novel Electron Cyclotron Wave Resonance Reactor

Investigation of Inductively Coupled Ar and CH4/Ar Plasmas and the Effect of Ion Energy on DLC Film Properties

Diagnostics of low and atmospheric pressure plasmas by means of mass spectrometry

Influence of acetylene to argon flow rate ratios on structure and properties of hydrogenated amorphous carbon films produced on steel substrates by plasma immersion ion implantation and deposition

Deposition of Hydrogenated Amorphous Carbon Nitride Films by Dielectric Barrier Discharge Plasmas

Determinations of Intermediate Neutral Species in Hydrocarbon Discharge Plasma

Auger Electron Spectroscopy of Surfaces During Exposure to Gaseous Discharges

Properties and deposition processes of a-C: H films from CH4/Ar dielectric barrier discharge plasmas