Resistivity Measurements in Palladium Hydride Film Prepared by Low-Temperature Hydrogen Absorption Method

Ryoma Kato,Ten-ichiro Yoshida,Riku Iimori,Tai Zizhou,Masanobu Shiga,Yuji Inagaki,Takashi Kimura,Tatsuya Kawae

DOI: https://doi.org/10.7566/jpsj.93.024703

2024-02-15

Journal of the Physical Society of Japan

Abstract:We investigated the superconducting properties of a palladium hydride (PdHx; x = H/Pd) film with a thickness of ∼100 nm prepared by a low-temperature hydrogen (H) absorption method. H atoms were loaded to a Pd film in H2 gas pressure of ∼0.25 MPa at temperatures of T = 180 and 150 K. At T = 180 K, after the resistivity variation due to H absorption was almost stopped, the PdHx film was cooled rapidly to low temperatures for the resistivity measurements. A superconducting transition was observed at Tc ∼ 1.1 K, where the transition width is smaller than 0.1 K. This indicates that a high-quality sample with a sharp transition can be obtained by providing sufficient time for H absorption. At T = 150 K, although the resistivity variation remained, the film was cooled. The transition temperature Tc increased to ∼2.1 K, whereas the transition width increased owing to the inhomogeneity of the H concentration in the film. Curiously, regardless of the H homogeneity, there remained a similar T-dependent residual resistivity in both films prepared at T = 180 and 150 K after the superconducting transition. This implies that the observed residual resistivity is essential for the future of the system, although its origin is not clear.

physics, multidisciplinary