Adsorption, Vibration, and Diffusion of O Atoms on Rh Low-Index and (711) Stepped Defective Surfaces.
ZY Diao,C Hao,ZX Wang,CC Dong,XH Pang
DOI: https://doi.org/10.1021/jp0503258
IF: 3.466
2005-01-01
The Journal of Physical Chemistry B
Abstract:The adsorption, vibration, and diffusion of O atoms on Rh(100), Rh(111), Rh(110), and Rh(711) surfaces were studied using the 5-parameter Morse potential (5-MP) of interaction between an adatom and a metal surface cluster. Our theoretical calculations provide information about adsorption sites, adsorption geometry, binding energy, and eigenvibration. Our results agreed very well with experimental results. Four major results follow. First, the theoretical calculation showed that on the Rh(100) surface the 4-fold hollow site is the only adsorption site. Second, on the O-Rh(111) system, the 3-fold hollow site is the stable adsorption site. Third, on the Rh(110) surface at low coverage, the O atom is adsorbed preferably on the pseudo-3-fold site, while with increasing coverage, the O atom is adsorbed not only on the pseudo-3-fold site but also on the long bridge site. Last, as for the Rh(711) stepped surface, the 3-fold site on the (111) step is metastable, whereas the 4-fold sites on the (100) terrace are stable, which enables the O atoms to diffuse easily from the 3-fold to the 4-fold site at low coverage. Therefore, the O atoms are adsorbed preferrably on the stable 4-fold sites of the (100) terrace and then later as coverage increases on the metastable 3-fold site of the (110) step.