Abstract:Dimensional scaling trends will eventually bring semiconductor critical dimensions (CDs) down to only a few atoms in width. New optical techniques are required to address the measurement and variability for these CDs using sufficiently small in-die metrology targets. Recently, Qin et al. [Light Sci Appl, 5, e16038 (2016)] demonstrated quantitative modelbased measurements of finite sets of lines with features as small as 16 nm using 450 nm wavelength light. This paper uses simulation studies, augmented with experiments at 193 nm wavelength, to adapt and optimize the finite sets of features that work as in-die-capable metrology targets with minimal increases in parametric uncertainty. A finite element based solver for time-harmonic Maxwell’s equations yields two- and three-dimensional simulations of the electromagnetic scattering for optimizing the design of such targets as functions of reduced line lengths, fewer number of lines, fewer focal positions, smaller critical dimensions, and shorter illumination wavelength. Metrology targets that exceeded performance requirements are as short as 3 μm for 193 nm light, feature as few as eight lines, and are extensible to sub-10 nm CDs. Target areas measured at 193 nm can be fifteen times smaller in area than current state-of-the-art scatterometry targets described in the literature. This new methodology is demonstrated to be a promising alternative for optical model-based in-die CD metrology.

Fourier domain optical tool normalization for quantitative parametric image reconstruction.

Deep subwavelength nanometric image reconstruction using Fourier domain optical normalization

Quantitative microscope characterization for optical measurements with sub-nm parametric uncertainties

Multiple-order imaging for optical critical dimension metrology using microscope characterization

Phase sensitive parametric optical metrology: exploring the limits of three-dimensional optical metrology

3-D Optical Metrology of Finite sub-20 nm Dense Arrays using Fourier Domain Normalization | NIST

Quantitative tool characterization of 193nm scatterfield microscope

Nonlinear Optimization Approach for Fourier Ptychographic Microscopy

Fourier imaging for nanophotonics

Assessing Quantitative Optical Imaging for Realizing In-die Critical Dimension Metrology | NIST

High-speed Fourier Ptychographic Microscopy for Quantitative Phase Imaging.

Enabling quantitative optical imaging for in-die-capable critical dimension targets

The Application of Fractional Fourier Transform in the Nonlinear Optical Imaging Measurement

Fourier synthesis optical diffraction tomography for kilohertz rate volumetric imaging

Numerical Optimization of Sensitivity in Fourier Domain Optical Coherence Tomography

Dispersion Correction For Optical Coherence Tomography By Parameter Estimation In Fractional Fourier Domain

Direct Numerical Modeling as a Tool for Optical Coherence Tomography Development: SNR (Sensitivity) and Lateral Resolution Test Target Interpretation

Fourier optics: basic concepts

Optimizing the nanoscale quantitative optical imaging of subfield scattering targets.

Reconstruction in Time Resolved Optical Computer Tomography Using Optimization Approach

Improving optical measurement uncertainty with combined multitool metrology using a Bayesian approach.