Abstract:The successful combination of electromagnetic scattering simulations and optical measurements allows for the quantification of deep-subwavelength features, including thicknesses via ellipsometry and parameterized geometries via scatterometry. Although feature size reduction has slowed in recent years, nanoelectronics still yields ever-smaller structures, thus optical measurement capabilities are ever-challenged. The critical problem is that the optical properties of materials often become thickness dependent at sub-5 nm, greatly complicating accurate fitting. These optical properties can be characterized empirically using ellipsometry and used with other prior information to reduce uncertainties via hybrid metrology, but atomistic modeling offers a unique perspective on the macroscopic optical response from features with dimensions only a few atoms in width. To illustrate the potential of such modeling, we have performed a series of density-functional theory (DFT) calculations for an ultrathin film, Si with hydrogen-terminated Si(111) surfaces. Kohn-Sham wavefunctions determined in DFT are instrumental in solving for the dielectric tensor of these configurations, as the in-plane and out-of-plane components can differ greatly with respect to incident wavelength and Si thickness. Techniques for DFT and dielectric tensor determination are reviewed, highlighting both their limitations and potential for improving optics-based metrology. The thickness- and wavelength-dependence of the resulting tensor components are parameterized using Tauc-Lorentz and Lorentz oscillators. Using an illustration from goniometric reflectometry, the quantitative effects upon dimensional metrology of employing the full thickness-dependent dielectric tensor are compared against simpler approximations of these optical properties. Reductions in parametric uncertainty in the thickness and optical constants are evaluated with a prior knowledge of the ultrathin film’s thickness with uncertainties.

Improving optical measurement accuracy using multi-technique nested uncertainties

Angle-resolved optical metrology using multi-technique nested uncertainties

Nested uncertainties and hybrid metrology to improve measurement accuracy

Improving optical measurement uncertainty with combined multitool metrology using a Bayesian approach.

Use of Bayesian Statistics to Improve Optical Measurement Uncertainty by Combined Multi-Tool Metrology

Uncertainty Evaluation and Optimization of INS Installation Measurement Using Monte Carlo Method

A Bayesian statistical model for hybrid metrology to improve measurement accuracy

Optimizing hybrid metrology: rigorous implementation of Bayesian and combined regression

A Novel Method for Analyzing the Influence of Relative Attitude of Laser Profile Scanner on 3D Measurement System

Combining model-based measurement results of critical dimensions from multiple tools

The effect of systematic errors on the hybridization of optical critical dimension measurements

Modeling and Analysis of Uncertainty in On-Machine Form Characterization of Diamond-Machined Optical Micro-Structured Surfaces

Improved Measurement Accuracy in Optical Scatterometry Using Fitting Error Interpolation Based Library Search

Holistic metrology approach: hybrid metrology utilizing scatterometry, critical dimension-atomic force microscope and critical dimension-scanning electron microscope

A hybrid total measurement uncertainty methodology for dual beam FIB/SEM metrology

Quantitative microscope characterization for optical measurements with sub-nm parametric uncertainties

Improving the Surface Metrology Accuracy of Optical Profilers by Using Multiple Measurements

Fitting the AFM force-distance curves the correct way

Supplementing rigorous electromagnetic modeling with atomistic simulations for optics-based metrology

Multiple-order imaging for optical critical dimension metrology using microscope characterization

Estimation of the Measurement Uncertainty Based on Quasi Monte-Carlo Method in Optical Measurement