High yield of a variety of silicon-boron radicals and their reactivity

Mohd Nazish,Yi Ding,Christina M Legendre,Arun Kumar,Nico Graw,Brigitte Schwederski,Regine Herbst-Irmer,Parameswaran Parvathy,Pattiyil Parameswaran,Dietmar Stalke,Wolfgang Kaim,Herbert W Roesky,Christina M. Legendre,Parvathy P
DOI: https://doi.org/10.1039/d2dt01318e
IF: 4
2022-06-27
Dalton Transactions
Abstract:Herein we report stable silicon-boron radicals of composition LSi(NMe2)-B(Br)Tip (1), LSi(NMe2)-B(I)Tip (2) LSi(tBu)-B(I)Tip (3) [L=PhC(NtBu)2]. They were prepared in high yield using a one-pot reaction of LSiR, X2BTip, and KC8 in a 1:1:1 molar ratio (R= tBu, NMe2; X= Br, I). The reaction of silicon-boron radical with Br2 and Se affords dihalogenated compound LSi(tBu)-B(Br2)Tip (4) and oxidative addition product LSi(tBu)=Se (5). All the compounds were characterized by single-crystal X-ray structural analysis and electron paramagnetic resonance (EPR) analysis, elemental analysis, multinuclear NMR spectroscopy, and mass spectrometry. Quantum chemical calculations show that the B-centered radicals 1-3 are stabilized by hyper conjugative interactions.
chemistry, inorganic & nuclear
What problem does this paper attempt to address?