Strong interference-based ultrathin conductive anti-reflection coating on metal substrates for optoelectronics
Hongyan Liu,Jingjing Peng,Weiming Liu,Yonglin Wang,Jianhua Wu,Guanli Zhang,Xiaoli Wang,Yue Yan
DOI: https://doi.org/10.1038/s41427-018-0011-z
IF: 10.761
2018-04-01
NPG Asia Materials
Abstract:Anti-reflection layers, which comprise one or more films of dielectric or metallic materials, are widely used in many applications, such as solar cells, to reduce unwanted reflection loss or overcome undesirable color features. Many conventional anti-reflection layers are based on multilayer interference, index matching, surface texturing and plasmonic phenomena. Here, we present a novel paradigm that suppresses the reflection of light from a metallic surface by using an ultrathin, conductive CuO coating. This new anti-reflection concept relies on the strong inference inside the ultrathin, absorptive CuO coating. We derive the optimal conditions for minimal reflectance and expound how the film thickness impacts the reflectance. It is shown that zero reflectance can almost be obtained at a wavelength of ca. 550 nm over a wide range of incident angles. As a proof-of-concept experiment, a transparent conductive electrode with a record figure of merit was fabricated based on a CuO/Cu double-layer structure, of which CuO was used to tune the chromaticity of the resultant TCEs and protect Cu from oxidation. This technology has the potential for many applications, especially for photoelectrochemical cells, which can be used to simultaneously enhance the total absorption and reduce the minority charge carrier collection length.
materials science, multidisciplinary