Advanced oxidation processes by UV/H2O2 for the removal of anionic surfactants in a decentralized wastewater treatment plant in Ecuador

Zambrano-Aranea Jennifer,Arcentales-Dueñas Sonia,Escala-Benites Francesca,Flores-Manrique Nadia,Mosquera-Romero Suanny
DOI: https://doi.org/10.2166/wst.2024.311
IF: 2.43
2024-09-23
Water Science & Technology
Abstract:Surfactants are persistent pollutants that pose risks to ecosystems and human health due to their low removal efficiency in conventional wastewater treatment plants. In Guayaquil, Ecuador, a decentralized facility discharges water with a surfactant concentration that exceeds the national legislation up to 20 times. This work aims to demonstrate the effectiveness of the advanced oxidation process UV/H2O2 in removing anionic surfactants as a tertiary treatment for the decentralized facility under investigation. A laboratory-scale batch system was tested for the treatment of real effluent with three hydrogen peroxide concentrations (100, 250, and 500 mg L−1) and UV exposure up to 120 min. All experimental trials were run in duplicate. After 60 min of UV exposure with 250 mg L−1 of H2O2, the anionic surfactant removal was 94.3 ± 4.3%, and the effluent complied with the discharge limits (<0.5 mg L−1). These operational parameters were selected for continuous laboratory-scale experiments to simulate the facility operation, achieving a maximum removal of 92.3 ± 2.5%. Although the reactor demonstrates a high removal rate, improvements to its configuration are necessary to meet discharge limits. The UV/H2O2 process allowed the removal of anionic surfactants, suggesting its feasibility as a complementary treatment in decentralized plants with similar problems.
environmental sciences,engineering, environmental,water resources
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