Vertically aligned interlocked tungsten oxide nanosheet thin film for photocatalytic application: effect of deposition cycles

Yogesh M. Chitare,Vikas V. Magdum,Shirin P. Kulkarni,Shweta V. Talekar,Shraddha A. Pawar,Prashant D. Sawant,Dhanaji B. Malavekar,Umakant M. Patil,Jin H. Kim,Sabah Ansar,Jayavant L. Gunjakar

DOI: https://doi.org/10.1007/s10854-024-13184-1

2024-07-20

Journal of Materials Science Materials in Electronics

Abstract:In this work, vertically aligned interlocked tungsten oxide (WO 3 ) nanosheets are deposited on non-conducting substrates using the modified chemical solution deposition (MCSD) method. The number of deposition cycles is varied to tune the physicochemical properties of WO 3 thin films. The WO 3 thin films exhibit an orthorhombic crystal structure with a preferred orientation along the (111) plane. The WO 3 thin film shows the vertically aligned interlocked nanosheet morphology with a change in the lateral dimensions upon varying the number of deposition cycles. All the WO 3 thin films exhibited strong visible light harvesting characteristics in the 510–530 nm wavelength range. The WO 3 thin films are used for the visible-light-active photocatalytic degradation of organic molecules such as methylene blue (MB), rhodamine B (Rh B) and tetracycline hydrochloride (TC). The optimized WO 3 thin film shows maximum photocatalytic degradation performance of 92, 89 and 87% in 210 min for MB, Rh B and TC, respectively. The present study illustrates the usefulness of the MCSD approach for depositing vertically aligned interlocked WO 3 nanosheet thin films and enhancing photocatalytic performance.

engineering, electrical & electronic,materials science, multidisciplinary,physics, condensed matter, applied