Surface-diffusion-limited growth of atomically thin WS2 crystals from core-shell nuclei

Sunghwan Jo,Jin-Woo Jung,Jaeyoung Baik,Jang-Won Kang,Il-Kyu Park,Tae-Sung Bae,Hee-Suk Chung,Chang-Hee Cho,Jin-woo Jung,IL-KYU PARK,Tae Sung Bae
DOI: https://doi.org/10.1039/C9NR01594A
IF: 6.7
2019-10-07
Nanoscale
Abstract:Atomically thin transition metal dichalcogenides (TMDs) have recently attracted great attention since the unique and fascinating physical properties have been found in various TMDs, implying potential applications in next-generation devices. The progress towards developing new functional and high-performance devices based on TMDs, however, is limited by the difficulty of producing large-area monolayer TMDs due to a lack of knowledge of the growth processes of monolayer TMDs. In this work, we have investigated the growth processes of monolayer WS 2 crystals using a thermal chemical vapor deposition method, in which the growth conditions were adjusted in a systematic manner. It was found that, after forming WO 3 -WS 2 core-shell nanoparticles as nucleation sites on a substrate, the growth of three-dimensional WS 2 islands proceeds by ripening and crystallization processes. Lateral growth of monolayer WS 2 crystals subsequently occurs by surface diffusion process of adatoms toward the step edge of the three-dimensional WS 2 islands. Our results provide understanding of the growth processes of monolayer WS 2 by using chemical vapor deposition methods.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology,chemistry
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