ALD-enabled WO3-MoO3 nanohybrid heterostructure for high-performance electrochemical supercapacitors

Nasrin Siraj Lopa,Mohammad Karbalaei Akbari,Hong Liang Lu,Serge Zhuiykov

DOI: https://doi.org/10.1016/j.est.2024.110777

IF: 9.4

2024-04-01

Journal of Energy Storage

Abstract:To achieve high-performance electrochemical supercapacitors (ESCs), it is crucial to control thin-film electrode fabrication. The uniform thickness of these electrodes is of paramount importance as it enables the rapid electrochemical responses during the charge-discharge processes, facilitated by their shorter charge and ion diffusion lengths. This research presents a WO3-MoO3 wafer-scaled nanohybrid electrode with a thickness of less than 10.0 nm for ESCs applications fabricated by atomic layer deposition (ALD) technique. The developed heterostructure electrode exhibited high purity, well-defined crystallinity and uniform morphology, enabling efficient pseudocapacitive Faradaic redox reactions with good reversibility. Notably, the fabricated electrode displayed impressive super-capacitive performance, delivering a specific capacitance (Cs) of up to 1094.80 and 803.10 F g−1 at scan rates of 5 mV/s and a high current density of 19.23 A g−1, respectively. The enhanced energy storage capacity of this heterostructure can be attributed to the improved redox activity and reduced ion diffusion length facilitated by the WO3-MoO3 nanohybrid thin-films. Additionally, the electrode demonstrated outstanding electrochemical stability with Cs retention of ∼93.25 % after 5000 galvanostatic charge/discharge cycles.

energy & fuels