Correction: Strain mapping inside an individual processed vertical nanowire transistor using scanning X-ray nanodiffraction

Dmitry Dzhigaev,Johannes Svensson,Abinaya Krishnaraja,Zhongyunshen Zhu,Zhe Ren,Yi Liu,Sebastian Kalbfleisch,Alexander Björling,Filip Lenrick,Zoltan Imre Balogh,Susanna Hammarberg,Jesper Wallentin,Rainer Timm,Lars-Erik Wernersson,Anders Mikkelsen
DOI: https://doi.org/10.1039/d2nr90060b
IF: 6.7
2022-01-01
Nanoscale
Abstract:Correction for ‘Strain mapping inside an individual processed vertical nanowire transistor using scanning X-ray nanodiffraction’ by Dmitry Dzhigaev et al. , Nanoscale , 2020, 12 , 14487–14493, DOI: 10.1039/D0NR02260H.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology,chemistry
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