Defect‐free Nano‐welding of Bilayer SnSe Nanoplates

Jing‐Rong Ji,John W. Villanova,Salvador Barraza‐Lopez,Stuart S. P. Parkin,Kai Chang
DOI: https://doi.org/10.1002/adma.202312199
IF: 29.4
2024-06-22
Advanced Materials
Abstract:Nano‐welding is a bottom‐up technique to create custom designed nanostructures and devices beyond the precision of lithographic methods. Here, we report a new technique based on anisotropic lubricity at the van der Waals interface between monolayer and bilayer SnSe nanoplates and a graphene substrate, to achieve precise control of the crystal orientation and the interface during the welding process. As‐grown SnSe monolayer and bilayer nanoplates are commensurate with graphene's armchair direction but lack commensuration along graphene's zigzag direction, resulting in a reduced friction along that direction and a rail‐like, one dimensional movement that permits joining nanoplates with high precision. This way, molecular beam epitaxially grown SnSe nanoplates of lateral sizes 30∼100 nm are manipulated by the tip of a scanning tunneling microscope at room temperature. In situ annealing is applied afterwards to weld contacting nanoplates without atomic defects at the interface. This technique can be generalized to any van der Waals interfaces with anisotropic lubricity and is highly promising for the construction of complex quantum devices, such as field effect transistors, quantum interference devices, lateral tunneling junctions, and solid‐state qubits. This article is protected by copyright. All rights reserved
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
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