Contribution of Halides in CsX (X=Cl, Br and I) Thin Films on the formation of SPR peaks

Kuldeep Kumar,P. Arun,Chhaya Ravi Kant,Bala Krishna Juluri,P.Arun
DOI: https://doi.org/10.48550/arXiv.1310.4888
2013-10-18
Materials Science
Abstract:This manuscript describes the evolution of grain structures in Cesium Halide films which results in appearance of Surface Plasmon Resonance (SPR) peaks in UV-visible absorption spectra. Thin films of Cesium Halide grown by thermal evaporation are polycrystalline in nature with large irregular tightly packed grains with sharp grain boundaries. With time these grain boundaries recede to become smaller and spherical in shape in order to minimize the free surface energy of the system. The process is also assisted by the presence of point defects/color centers in Cesium Halide films. These defects which appear due to the absence of massive halide atoms from the lattice results in residual tensile stress within the lattice which results in defect diffusion. The defects migrate outwards towards the grain surface giving rise to Cesium metal clusters. The lattice mismatch appearing between the lattices at the grain boundary and the bulk giving rise to Core-shell structure further contributes to grain division. Along with this volume diffusion, a surface diffusion of Cesium takes place towards sites of faceted grain boundaries resulting in a necking phenomenon, appearing like bridges between the daughter Cesium Halide grains (grains appearing due to division of a single grain). Breaking away of the daughter Cesium Halide grains results in nano-rods that contribute to the SPR peak seen.
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