Hot‐pressing Metal Covalent Organic Frameworks as Personal Protection Films
Jiajia Wang,Li Li,Chuanshan Xu,Hong Jiang,Qin‐Xie Xie,Xin‐Yi Yang,Ji‐Cheng Li,Huiying Xu,Yifa Chen,Wei Yi,Xu‐Jia Hong,Ya‐Qian Lan
DOI: https://doi.org/10.1002/adma.202311519
IF: 29.4
2023-12-23
Advanced Materials
Abstract:Effective personal protection is crucial for controlling infectious disease spread. However, commonly used personal protective materials such as disposable masks lack antibacterial/antiviral function and may lead to cross infection. Herein, we proposed a polyethylene glycol assisted solvent‐free strategy to rapidly synthesize a series of donor‐acceptor metal‐covalent organic frameworks (MCOFs) (i.e., GZHMU‐2, JNM‐1 and JNM‐2) under air atmosphere and henceforth extend it via in‐situ hot‐pressing process to prepare MCOFs based films with photocatalytic disinfect ability. Best of them, the newly designed GZHMU‐2 has a wide absorption spectrum (200 nm to 1500 nm) and can efficiently produce reactive oxygen species under sunlight irradiation, achieving excellent photocatalytic disinfection performance. After in‐situ hot‐pressing as a film material, the obtained GZHMU‐2/NMF can effectively kill E. coli (99.99%), S. aureus (99%), and H1N1 (92.5%), meanwhile possessing good reusability. Noteworthy, the long‐term use of GZHMU‐2/NWF based mask has verified no damage to the living body by measuring the expression of mouse blood routine, lung tissue and inflammatory factors at the in‐vivo level. This article is protected by copyright. All rights reserved
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology