Development of flexible photothermal superhydrophobic microarray by photolithography technology for anti-icing and deicing

Chenglong Guo,Ke Liu,Tongxing Zhang,Peng Sun,Lin Liang
DOI: https://doi.org/10.1016/j.porgcoat.2023.107675
IF: 6.6
2023-06-02
Progress in Organic Coatings
Abstract:Superhydrophobic material is widely utilized as one of excellent candidates for anti-icing. Unfortunately, the undesirable mechanical property and unprecise preparation method have significantly hindered its further application. In this work, a flexible superhydrophobic microarray was developed using photolithography technology, where its maximal water contact angle reached 151.1 ± 0.9° by optimizing its microcolumn spacing and height. Moreover, carbon black nanoparticles were introduced into the flexible superhydrophobic microarray to endow it with outstanding photothermal conversion performance. As a result, when the flexible photothermal superhydrophobic microarray was used in the fields of anti-icing and deicing, the time for a water droplet on it to be completely frozen was delayed by 87 %, as well as it took 43.1 % and 28.5 % less time for an ice pellet and an ice sheet on it to be removed, respectively. In addition, the flexible photothermal superhydrophobic microarray was in possession of prominent stability. In conclusion, by the combination of passive anti-icing and active deicing, this work presented a novel way to broaden the application of photolithography technology and provided a competent candidate for anti-icing and deicing.
materials science, coatings & films,chemistry, applied
What problem does this paper attempt to address?