Enhanced electrophoretic deposition of hydrophobic BiVO 4 photocatalytic coatings using Cu 2+ ions as stabilizing agent

D.B. Hernández-Uresti,M.A. Ruíz-Gómez,A. Vázquez,S. Obregón

DOI: https://doi.org/10.1016/j.mtchem.2024.102065

IF: 7.613

2024-04-27

Materials Today Chemistry

Abstract:In this work, we report the preparation of monoclinic bismuth vanadate (BiVO 4 ) coatings through an electrophoretic deposition process (EPD) using Cu 2+ ions as a charge-stabilizing agent. BiVO 4 was prepared through a rapid coprecipitation route, yielding rounded nanoparticles with sizes smaller than 100 nm. The bismuth vanadate nanoparticles were dispersed in isopropyl alcohol for electrophoretic deposition onto aluminum plates using a constant applied voltage of 12 V for 30 min. The results have shown that the deposited amount of BiVO 4 nanoparticles increases with the initial concentration of the Cu(NO 3 ) 2 ⋅5H 2 O additive. According to XPS analysis, EPD coatings exhibit the presence of metallic copper due to the reduction of Cu 2+ ions on the BiVO 4 during the electrophoretic deposition process. The photocatalytic properties of BiVO 4 coatings were assessed in the degradation of the antibiotic tetracycline under simulated solar irradiation. The BiVO 4 coating prepared with an initial concentration of 0.5 mM of Cu(NO 3 ) 2 ⋅5H 2 O exhibited the highest photocatalytic performance, achieving a degradation efficiency of approximately 92 % after 240 min of irradiation. Furthermore, the BiVO 4 coatings displayed superhydrophobic properties, as determined by measuring static water contact angles.

chemistry, multidisciplinary,materials science