Effect of the chloride ion on the degradation of PPCPs in UV/persulfate and UV/H 2 O 2 and the role of radicals in these systems

Hoang Tien Nguyen
DOI: https://doi.org/10.2139/ssrn.4591285
IF: 7.7
2024-01-06
Journal of Environmental Chemical Engineering
Abstract:This work comprehensively studied the kinetic degradation of ciprofloxacin (CIP), levofloxacin (LEV), and sulfanilamide (SAA) by UV/PS/Cl and UV/H 2 O 2 /Cl. UV contributed to the degradation of SAA to a great extent, resulting in the highest degradation, compared with the other PPCPs. 10 mM of Cl - slightly enhanced the degradation of LEV and SAA, while higher concentrations of Cl - (up to 1000 mM) inhibited the degradation of all the PPCPs in most processes. Increasing the concentration of Cl - to 1000 mM resulted in the decrease in the concentrations of •OH (which decreased by 88 – 96%) and SO 4 •- (which decreased by 67.4%) in UV/PS/Cl. With the increase in the concentration of Cl - to 1000 mM, the contributions of •OH and SO 4 •- to the degradation of the PPCPs were almost completely masked by the contribution of Cl• (except in the case of SAA). The relationship between the natural logarithms of the second-order rate constant of SO 4 •- and Cl• with PPCPs versus the Hammett constant was established and used to determine the second-order rate constant of SAA towards SO 4 •- . Acidic pH and neutral pH were conducive for the degradation of the PPCPs in the process. The presence of various constituents, including anions (i.e., HCO 3 - , SO 4 2- , and NO 3 - ) and metal cations (i.e., Fe 2+ , Ni 2+ , Co 2+ and Mn 2+ ) inhibited the degradation rate of the PPCPs to varying degrees. In the presence of 10 mM Cl - and other anions, •OH and SO 4 •- were consumed by Cl - , up to 71 – 90% and 8 – 10% in UV/PS/Cl, respectively. Toxicity assessment showed that 10 mM Cl - in UV/PS/Cl and UV/H 2 O 2 /Cl did not cause any significant inhibition on the growth of Chlorella vulgaris and Escherichia coli ( E.Coli ), compared with that in the absence of Cl - . In summary, Cl• is an important radical that can replace •OH and SO 4 •- in UV/PS or UV/H 2 O 2 under saline conditions.
engineering, chemical, environmental
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