From atomistic simulation towards multiscale modelling of materials

Risto M Nieminen
DOI: https://doi.org/10.1088/0953-8984/14/11/306
2002-03-08
Abstract:This paper discusses some current trends in computational materials science, especially the striving to forge links between modelling activities at various length and timescales. At the atomistic scale, methods based on quantum mechanical, especially density-functional, theories for electronic properties link to atomic/molecular dynamics and kinetic Monte Carlo simulations. Coarse graining leads to lattice-gas and cellular automata, and eventually to continuum equations solved by finite-element and finite-difference techniques. As examples of hierarchical modelling of materials, the paper describes recent work on anisotropic chemical etching of silicon, irradiation processing of fullerenes, oxygen clustering in silicon and self-diffusion in the compound semiconductor GaSb.
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