Fabrication of quantum emitters in aluminum nitride by Al-ion implantation and thermal annealing

E. Nieto Hernández,H. B. Yağcı,V. Pugliese,P. Aprà,J. K. Cannon,S. G. Bishop,J. Hadden,S. Ditalia Tchernij,P. Olivero,A. J. Bennett,J. Forneris

DOI: https://doi.org/10.1063/5.0185534

IF: 4

2024-03-18

Applied Physics Letters

Abstract:Single-photon emitters (SPEs) within wide-bandgap materials represent an appealing platform for the development of single-photon sources operating at room temperatures. Group III-nitrides have previously been shown to host efficient SPEs, which are attributed to deep energy levels within the large bandgap of the material, in a configuration that is similar to extensively investigated color centers in diamond. Anti-bunched emission from defect centers within gallium nitride and aluminum nitride (AlN) have been recently demonstrated. While such emitters are particularly interesting due to the compatibility of III-nitrides with cleanroom processes, the nature of such defects and the optimal conditions for forming them are not fully understood. Here, we investigate Al implantation on a commercial AlN epilayer through subsequent steps of thermal annealing and confocal microscopy measurements. We observe a fluence-dependent increase in the density of the emitters, resulting in the creation of ensembles at the maximum implantation fluence. Annealing at 600 °C results in the optimal yield in SPEs formation at the maximum fluence, while a significant reduction in SPE density is observed at lower fluences. These findings suggest that the mechanism of vacancy formation plays a key role in the creation of the emitters and open enticing perspectives in the defect engineering of SPEs in solid state.

physics, applied