Decomposition mechanism of C4F7N/CO2 gas mixture based on molecular dynamics and effect of O2 content

Danchen Zhao,Jing Yan,Ruixin He,Yingsan Geng,Zhiyuan Liu,Jianhua Wang

DOI: https://doi.org/10.1063/5.0174959

IF: 2.877

2024-01-08

Journal of Applied Physics

Abstract:C4F7N/CO2 gas mixtures have attracted extensive attention because of their excellent insulating properties and environmental friendliness. High electrical and thermal stability is an important indicator for evaluating their performance, but there have been few molecular dynamics studies of their decomposition mechanisms. In this study, using ReaxFF molecular dynamics simulations and quantum chemistry theory, the decomposition mechanism of a C4F7N/CO2 gas mixture and the effect of the O2 content on the decomposition of the mixture were simulated on the microscopic level. It was found that there are three main decomposition pathways of C4F7N molecules, of which the generation of C3F4N⋅ and CF3⋅ free radicals is the most likely to occur. COF2 is the main oxygen-containing product of the C4F7N/CO2 gas mixture, and its generation is significantly affected by the simulation time and temperature. COF2 can be regarded as the characteristic decomposition product of the C4F7N/CO2 gas mixture. The addition of O2 slightly promotes the decomposition of C4F7N, whereas the maximum decomposition rate of CO2 decreases by 0.3% and 1% after the addition of 2% and 8% O2, respectively. Relevant results of this research can provide a theoretical basis and guidance for research into the performance of C4F7N/CO2 gas mixtures and practical engineering applications of these mixtures in the future.

physics, applied