Key Sputtering Parameters for Precursor In 2 O 3 Films to Achieve High Carrier Mobility
Junichi Nomoto,Takashi Koida,Iwao Yamaguchi,Tomohiko Nakajima
DOI: https://doi.org/10.1021/acsami.4c09669
IF: 9.5
2024-11-01
ACS Applied Materials & Interfaces
Abstract:Owing to their extremely high carrier mobility (μ) of >100 cm2/(V s) and suitable low carrier concentrations, transparent conducting films of solid-phase crystallized H-doped In(2)O(3) (spc-IO:H) exhibit high conductivity with high optical transparency over a broad frequency range. These properties can be attributed to solid-phase crystallization of the amorphous precursor film. Therefore, the development of high-quality spc-IO:H films requires the deposition conditions of the precursor films to...
materials science, multidisciplinary,nanoscience & nanotechnology
What problem does this paper attempt to address?