TiO 2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition for Rear Surface Passivation of p-PERT Solar Cells

Adriano Moehlecke,José Cristiano Mengue Model,Izete Zanesco,Moussa Ly,Ly,Moussa
DOI: https://doi.org/10.1590/1980-5373-mr-2023-0540
2024-04-15
Materials Research
Abstract:Moehlecke, Adriano ; Model, José Cristiano Mengue ; Zanesco, Izete ; Ly, Moussa ; The aim of this paper was to analyze the passivation of the rear face of silicon solar cells by TiO2 thin films produced by atmospheric pressure chemical vapor deposition (APCVD). A compact high-throughput APCVD system was employed to deposit the TiO2 films. Silicon solar cells with a n+pp+ PERT (passivated emitter rear totally-diffused) structure were produced and characterized. The use of TiO2 on the rear face resulted in a 0.5 mA/cm2 increase in short-circuit current density and a 0.5% absolute improvement in efficiency compared to devices without a passivation layer. Analyzing the internal quantum efficiency of the devices, we concluded that this economically technique provides passivation on the p+ surface, doped with boron, similar to that obtained with thermally grown silicon oxide films.
materials science, multidisciplinary
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