Photochemical reaction of NO2 on photoactive mineral dust: Mechanism and irradiation intensity dependence

Tao Wang,Yangyang Liu,Yue Deng,Hanyun Cheng,Yang Yang,Liwu Zhang
DOI: https://doi.org/10.1016/j.jphotochem.2021.113319
2021-07-01
Abstract:<p>Photochemical reaction of NO<sub>2</sub> on semiconductor is of scientific significance in both photocatalytic NO<sub>x</sub> removal and nitrogenous aerosol formation. A fundamental understanding of the reaction mechanism and how irradiation intensity influences the product distribution and reaction kinetics remains uncertain. By means of DRIFTS (diffuse reflection infrared Fourier transform spectroscopy) and flow reactor system, we for the first time investigated the irradiation-intensity-dependence of this heterogeneous process. Surface nitrate and nitrite present opposite variations in response to light intensity. The formation rate of individual nitrogenous product is susceptible to the intensity variation of weak irradiation, while tends to be unsusceptible under strong irradiation. The phenomenon is explained by the balance between heterogeneous uptake of NO<sub>2</sub> and photoinduced generation of reactive oxygen species varying with irradiation intensity. The highest yield of total nitrogenous products appears under weak irradiation, indicating the photolysis of nitrite and photoreduction of nitrate under strong irradiation. The experimental results suggest that irradiation intensity should be introduced into atmospheric models for its varied impacts on heterogeneous chemistry. Moreover, irradiation intensity should be considered as an important factor in the photocatalytic removal of NO<sub>x</sub>.</p>
chemistry, physical
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