Thiol-Functionalized Adsorbents through Atomic Layer Deposition and Vapor-Phase Silanization for Heavy Metal Ion Removal

Vepa Rozyyev,Feng Gao,Yining Liu,Rahul Shevate,Rajesh Pathak,Anil U. Mane,Seth B. Darling,Jeffrey W. Elam
DOI: https://doi.org/10.1021/acsami.4c03935
IF: 9.5
2024-06-25
ACS Applied Materials & Interfaces
Abstract:The removal of toxic heavy metal ions from water resources is crucial for environmental protection and public health. In this study, we address this challenge by developing a surface functionalization technique for the selective adsorption of these contaminants. Our approach involves atomic layer deposition (ALD) followed by vapor-phase silanization of porous substrates. We utilized porous silica gel powder (∼100 μm particles, 89 m2/g surface area, ∼30 nm pores) as an initial substrate. This...
materials science, multidisciplinary,nanoscience & nanotechnology
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